polysilicon recipe

Ed Myers edmyers at stanford.edu
Fri Mar 16 07:36:48 PDT 2012


Poly is a challenge.  It is very dependent on the deposition 
temperature, so there is no correct recipe.  The best approach is to use 
a 3 component EMA film.  At 580C it will be a combination of crystalline 
silicon, amorphous silicon and voids.  I would suggest a 75-20-5 as the 
starting percentages.  As you go higher in temperature the percentage of 
crystalline silicon increases.  As you go lower, the percentage of 
amorphous silicon dominates.


On 3/15/2012 5:05 PM, Scott Lee wrote:
> Hi all,
> I'm trying to measure the thickness of unannealed polysilicon (in-situ 
> doped n-type, deposited at 580C) ontop of LTO (about 18000A). I 
> measured the oxide thickness on woollam before the poly deposition and 
> got a good fit.
> What is the best material recipe to use for poly? Does anyone have 
> experience with this?
> Thanks,
> Scott

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