edmyers at stanford.edu
Fri Mar 16 07:36:48 PDT 2012
Poly is a challenge. It is very dependent on the deposition
temperature, so there is no correct recipe. The best approach is to use
a 3 component EMA film. At 580C it will be a combination of crystalline
silicon, amorphous silicon and voids. I would suggest a 75-20-5 as the
starting percentages. As you go higher in temperature the percentage of
crystalline silicon increases. As you go lower, the percentage of
amorphous silicon dominates.
On 3/15/2012 5:05 PM, Scott Lee wrote:
> Hi all,
> I'm trying to measure the thickness of unannealed polysilicon (in-situ
> doped n-type, deposited at 580C) ontop of LTO (about 18000A). I
> measured the oxide thickness on woollam before the poly deposition and
> got a good fit.
> What is the best material recipe to use for poly? Does anyone have
> experience with this?
More information about the woollam