polysilicon recipe

Ludwig G. ludwig.galambos at gmail.com
Fri Mar 16 08:59:52 PDT 2012

Hi Scott,

If you have time, talk to Ted Kamins, he is THE expert to talk to

In case that you do know him, I can introduce you, we work together in
another project

Let me know


On Fri, Mar 16, 2012 at 7:36 AM, Ed Myers <edmyers at stanford.edu> wrote:

> Scott,
> Poly is a challenge.  It is very dependent on the deposition temperature,
> so there is no correct recipe.  The best approach is to use a 3 component
> EMA film.  At 580C it will be a combination of crystalline silicon,
> amorphous silicon and voids.  I would suggest a 75-20-5 as the starting
> percentages.  As you go higher in temperature the percentage of crystalline
> silicon increases.  As you go lower, the percentage of amorphous silicon
> dominates.
> Ed
> On 3/15/2012 5:05 PM, Scott Lee wrote:
>> Hi all,
>> I'm trying to measure the thickness of unannealed polysilicon (in-situ
>> doped n-type, deposited at 580C) ontop of LTO (about 18000A). I measured
>> the oxide thickness on woollam before the poly deposition and got a good
>> fit.
>> What is the best material recipe to use for poly? Does anyone have
>> experience with this?
>> Thanks,
>> Scott
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <http://snf.stanford.edu/pipermail/woollam/attachments/20120316/8cb03ebc/attachment.html>

More information about the woollam mailing list