Furnaces, oxidation and annealing (clean, semi-clean and contaminated)
Thermco1-4 furnaces are used for wet and dry oxidation processing and N2 annealing.
SNF has two forming gas anneal furnaces; one for semi-clean work (tylanfga) and one for contaminated work (fga2). Forming gas is used to anneal or sinter metals after deposition. Both furnaces have low temp controllers with an operating range of about 300-600C. The furnaces are different enough to require separate training.
Silicon dioxide thickness calculators are a easy way to get either the oxidation time based on thickness or the thickness based on time. Labmembers simply input an oxidation temp and either the desired thickness or time. Watch this space for a SNF home grown calculator coming soon.
Thermco Oxide qualification wafer position. First position of first boat, 25th position of first boat and the 25th position of second boat. This is a 50 wafer spread.