Furnaces, oxidation and annealing (clean, semi-clean and contaminated)
The Tylan Oxidation and Annealing Furnaces are high temperature atmospheric furnaces made of pure quartz that allow for the introduction and mixing of gases (N2, Ar, O2 and H2) to grow silicon dioxide (SiO2) on silicon wafers. A quartz tube is brought up and maintained at a requested temperature by means of a heating element surrounded by an insulating material and encased in sheet metal. Quartz boats, which support the wafers while they are in the tube, are held aloft in the furnace by two quartz sheathed cantilevers.
Thermco1 and 2 furnaces are used for wet and dry oxidation processing. These are similar to tylan1 and 2, but offer 6" processing capability.
SNF has two forming gas anneal furnaces; one for semi-clean work (tylanfga) and one for contaminated work (fga2). Forming gas is used to anneal or sinter metals after deposition. Both furnaces have low temp controllers with an operating range of about 300-600C. The furnaces are different enough to require separate training.
Silicon dioxide thickness calculators are a easy way to get either the oxidation time based on thickness or the thickness based on time. Labmembers simply input an oxidation temp and either the desired thickness or time. Watch this space for a SNF home grown calculator coming soon.
Thermco Oxide qualification wafer position. First position of first boat, 25th position of first boat and the 25th position of second boat. This is a 50 wafer spread.