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Rapid Thermal Annealing

All-Win 610 Rapid Thermal Process Systems

The All-Win Rapid Thermal Process (RTP) systems are capable of annealing substrates in a variety of ambients: N2, Ar, N2:H2 forming gas, O2 for oxidizing Si, N2O for oxynitride, and NH3 for nitridation. Each system has a cold wall, quartz chamber, which is heated with top and bottom arrays of high intensity halogen lamps using a closed-loop temperature control.

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