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Hitachi S4160 SEM: sem4160

6 inch full wafer system for in-process inspection and metrology of photoresist, e-beam resist, and nanolithographic structures. * Semi-clean contamination level, No Au or Nobel metals allowed. * Field emission gun with resolution to ~35 angstoms typical. * On-board CD measurement and metrology functions.
SEM4160 Operating Instructions
Hitachi S-4160 Field Emission Scanning Electron Microscope for in-process inspection and metrology of photoresist, e-beam resist and nanolithographic structures with on-board CD measurement and metrology funstions.

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