AMT 8100 Plasma Etcher, amtetcher (semi-clean)
The Applied Materials Technologies 8100 Hexode plasma etcher.
Quick starts are a distillation of the more verbose Operating Instructions. The user of the tool should have read and understood the full Operating Instructions for the etcher.
This table shows the etch rates for various material when using the standard recipes.
Recent qual results for oxide, photoresist single crystal and poly silicon, and nitride etch rates and selectivities are given for quick reference.
This page contain recipes for the Amtetcher which are not used as often as the standard recipes. They may require the labmember to program the tool for their use. Additionally, these recipes have not be characterized so there will not be a list of etch rates for various materials included. Labmembers are encouraged to measure baseline etch ates for the materials to be etched.
Thanks to Zhiping Zhang for the photos.
The following pictures show what happens when the trays are not properly latched. Please contact the responsible staff member for more information.