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Lithography Solvent Bench, lithosolv

The lithosolv wet bench is used for handling solvents or other volatile organics such as photoresist. Processes performed here include mask and substrate cleaning and pouring resist into smaller containers for manual dispensing. Acids and bases (namely, developers) must never be handled here. Liquid waste is collected locally. A solid hazardous waste under the benchtop is used to collect cleanroom wipes, vinyl gloves, swabs, and other solid materials which may be contaminated with solvents and photoresist.

Picture and Location

 Lithography Solvent Bench

The tool is located at DE1 on the Lab Map.

Process Capabilities

Cleanliness Standard

 The lithosolv appears in all three equipment groups (clean, semiclean, and gold)

 

How to Become a User

  1. "All Litho" is required before training on any of the lithography tools. Contact the trainers for the class schedule and training materials (which must be reviewed before the class). If no training hours are indicated, training for the tool is covered in the "All Litho" session.
  2. Contact SNF training contact on the Equipment Summary page.

Operating Procedures

LITHOSOLVENT BENCH: SOLVENTS only, wear solvent resistant gloves

 

NO ACIDS OR BASES ALLOWED AT THIS BENCH!

PROCESSES
performed here include:
  • mask and substrate cleaning using solvents
  • pouring resist into smaller containers for manual dispensing
  • tweezers cleaning
  • manual development using solvent based developer
  • SU8 process, extra training required

No metal lift off, metal lift off should be done at the wbsolvent in the white light area

 

LABWARE provided at this bench is gold contaminated.

  • If you use contaminated glassware, your work will be gold contaminated. You will only be allowed to use equipment that allows gold (see MATERIALS section on our website).
  • For non-gold contaminated work, use your own designated glassware, labeled with your name and contamination level, and stored in your personal storage bin.

 

CONTAINERS OF SOLVENTS:

  • Keep all opened containers of solvent back at least 6 inches from the front of the exhaust hood. The red tape indicates 6 inches.
  • Leave containers not longer than one day at this bench.
  • Cover any open container of resist or chemical with foil, fill out a "blue card", and use a metal cart when transferring it to the coaters.

BLUE "IN-USE HAZARDOUS CHEMICALS" LABELS:

  • Must be completely filled out and left along side all open containers of chemicals (beakers..)
  • Full chemical names of all chemicals in the solution must be listed.
  • At this bench only, you may use the product name, if there is an MSDS sheet in the book located at the bench for the product (i.e. Shipley 3612 has an MSDS sheet in the book)

PHOTORESIST DISPOSAL:

  • Photoresist should be disposed of in the carboys (not down the drain -- it could plug up the drain).
  • Never pour used resist or any other chemical back to the original bottle!

SOLVENT WASTE COLLECTION:

  • Pour all solvents or resist in the carboys, not into the waste tank under the bench! 
  • Notify maintenance if the red light (located above the exhaust hood) is ON. It means the waste tank for the solvent bench is full and no solvents should be poured down the drain.

SOLID SOLVENT CONTAMINATED WASTE: Q-TIPS, WIPES, GLOVES…, no sharps

  • Work under the exhaust hood: put contaminated items in Zip Lock bag (you find some on top of this bench or in the stock room)
  • Place the Zip Lock bag inside of the red bucket under the bench
  •  When red bucket is full: seal the yellow hazardous waste bag with a tie-wrap and transfer the bag to the large gray container under the Solvent Bench behind the red bucket (make sure the top is replaced securely). Tie-wraps and extra plastic bags are located on top of the gray container or in the stock room


SHARPS SOLVENT CONTAMINATED: wafers, broken glassware, needles, ...

  • Work under the exhaust hood: put contaminated items in Zip Lock bag
  • Place the Zip Lock into the labeled sharps container next to the SVG coater.
  • Not chemically contaminated sharps waste (wafers with dried resist ok) can be placed into the sharps container in the service area, no zip lock bag needed

CLEAN UP:

  • Do NOT leave bottles of resist at the bench (they should be stored in the yellow solvent cabinets in the back maintenance isle behind the furnaces)
  • Refill solvent bottles
  • Clean up the bench after using it

SOLVENTS ODORS:

  • Notify staff immediately if any smell has been detected while working at this bench


We are required by the Stanford University - Utilities Services (Environmental Quality and Water Efficiency) to distribute the Best Management Practices (BMP) fact sheet, you'll find the link here in the Stanford University - Utilities Services folder. Please read the fact sheet and reduce the amount of pollutant for example by using smaller quantities of chemicals.

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