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ALD

Overall review of the ALD systems in the SNF. Savannah: a gold level contamination, thermal Cambridge Nanotech Savannah S200 system. Operational. Fiji1: a clean, plasma and thermal Cambridge Nanotech Fiji F202 chamber with ozone. Operational. Fiji2: an open material, plasma and thermal Cambridge Nanotech Fiji F202 chamber. Operational. Fiji3: a open material, plasma and thermal Cambridge Nanotech Fiji F200 chamber dedicated to oxide depositions. Anticipated online in early 2013. Savannah-mvd: a Cambridge Nanotech Savannah S200 system configured for Molecular Vapor Deposition and with the reaction chamber enclosed in an inert glovebox. Anticipated online in early 2013. Current SNF ALD film capabilities can be found on the Fiji1, Fiji2, and Savannah pages.
Savannah
Savannah is a thermal atomic layer deposition (ALD) system. It is a Savannah S200 from Cambridge Nanotech and is categorized as gold contaminated. The system can accommodate pieces up to an 8" wafer.
Fiji1
Fiji1 is a load-locked, plasma-enabled atomic layer deposition (ALD) system. Coupled with Fiji2, Fiji1 is a Fiji F202 system from Cambridge Nanotech and is used for plasma assisted ALD of various dielectric and metallic films. The system can accommodate pieces up to an 8" wafer. Fiji1 is currently classified as semi-clean.
Savannah Images
images for the savannah information page
Fiji images
Images for the documentation of both Fiji-L and Fiji-R.
Image map of fiji-l and fiji-r location in snf
Fiji2
Fiji2 is a load-locked, plasma-enabled atomic layer deposition (ALD) system. Coupled with Fiji1, Fiji2 is a Fiji F202 system from Cambridge Nanotech and is capable of both thermal and plasma assisted ALD of various dielectric and metallic films. The system can accommodate pieces up to an 8" wafer. Fiji2 is currently classified as gold contaminated and is open to a wide range of materials.
Image Fiji diagram
Image Thermal Alumina Example Recipe
Image Plasma Alumina Recipe Example
Image Fiji unload
Image Remove Plate
Image Thermal ZrOx Data
Image SNF Film Capabilities
Image SNF Film Capabilities as of 8/12
Image ZrOx thickness vs pulse time
Image ZrOx thickness vs pulse time
Image non uniformity vs pulse time
Image zrox thickness vs pulse time
Image saturated zrox thickness vs pulse time
Image Saturated non-uniformity vs pulse time
 
Image hfo2 average thickness vs pulse time
Image hfo2 non uniformity vs pulse time
Image hfo2 average thickness vs purge time
Image hfo2 non uniformity vs purge time
Image hfo2 average thickness vs background flow rate
Image hfo2 non uniformity vs background flow rate
File ALD Introductory Tutorial 2012-11-01
ALD Introductory Tutorial presented by Dr. J Provine 11/1/12 at Stanford University
File ALD In Depth Tutorial 2012-11-01
ALD In Depth Tutorial presented by Dr. J Provine 11/1/12 at Stanford University.
Films and Data
This page compiles the films available by atomic layer deposition at the Stanford Nanofabrication Facility and the characterization and monitoring data available for those films. If you are interested in particular films that do not appear here or characterization data for the films you do not see included here, please contact Michelle Rincon or J Provine.
Data Files
ALD characterization data files
Fiji3
The Fiji3 ALD system from Cambridge Nanotech/Ultratech is a plasma enabled atomic layer deposition system for deposition of restricted oxide films. The system allows a limited subset of gold contaminated substrates.

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