Skip to content. | Skip to navigation

Sections
Personal tools
You are here: Home / Equipment / Chemical Vapor Deposition / ALD

ALD

Overall review of the ALD systems in the SNF. Savannah: a gold level contamination, thermal Cambridge Nanotech Savannah S200 system. Operational. Fiji1: a clean, plasma and thermal Cambridge Nanotech Fiji F202 chamber with ozone. Operational. Fiji2: an open material, plasma and thermal Cambridge Nanotech Fiji F202 chamber. Operational. Fiji3: a open material, plasma and thermal Cambridge Nanotech Fiji F200 chamber dedicated to oxide depositions. Operational. Savannah-mvd: a Cambridge Nanotech Savannah S200 system configured for Molecular Vapor Deposition and with the reaction chamber enclosed in an inert glovebox. Operational. Current SNF ALD film capabilities can be found on the Fiji1, Fiji2, Fiji3, Savannah, and MVD pages.

Savannah

Savannah is a thermal atomic layer deposition (ALD) system. It is a Savannah S200 from Cambridge Nanotech and is categorized as gold contaminated. The system can accommodate pieces up to an 8" wafer. (Please be patient as the images load.)

Savannah - Read More…

Fiji1

Fiji1 is a load-locked, plasma-enabled atomic layer deposition (ALD) system. Coupled with Fiji2, Fiji1 is a Fiji F202 system from Cambridge Nanotech and is used for plasma assisted ALD of various dielectric and metallic films. The system can accommodate pieces up to an 8" wafer. Fiji1 is currently classified as semi-clean. (Please be patient as the images load.)

Fiji1 - Read More…

Fiji2

Fiji2 is a load-locked, plasma-enabled atomic layer deposition (ALD) system. Coupled with Fiji1, Fiji2 is a Fiji F202 system from Cambridge Nanotech and is capable of both thermal and plasma assisted ALD of various dielectric and metallic films. The system can accommodate pieces up to an 8" wafer. Fiji2 is currently classified as gold contaminated and is open to a wide range of materials. (Please be patient as the images load.)

Fiji2 - Read More…

Fiji3

The Fiji3 ALD system from Cambridge Nanotech/Ultratech is a plasma enabled atomic layer deposition system for deposition of restricted oxide films. The system allows a limited subset of gold contaminated substrates. (Please be patient as the images load.)

Fiji3 - Read More…

MVD

The MVD is a system consisting of a glovebox, plasma cleaner, and Savannah ALD tool which is used to deposit organic SAMS layers. Many thanks to Xiaoxing Xu, Ateeq Suria, Alex Piggott, and Felix Alfonso for their contributions to this page. (Please be patient as the images load.)

MVD - Read More…

Available Films at SNF

This folder contains a list of available ALD films at SNF. The film, characterization of it and full data are given.

Available Films at SNF - Read More…

EE412 Final Reports

This page presents final reports form the EE412 class that involve ALD tools.

EE412 Final Reports - Read More…

ALD Tutorials

This folder contains an Introductory and an In Depth tutorial. These tutorials were given by Dr J Provine during the NNIN ALD Roadshow in 2012.

ALD Tutorials - Read More…

ALD Images

This folder contains the images used in the documentation of the ALD tools.

ALD Images - Read More…

Document Actions