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ALD characterization data files
Thermal Alumina from Water
Data for thermal alumina ALD using trimethylaluminum and water as precursors
Plasma Al2O3
Thermal TiO2 from Water
TiO2 data from SNF
Plasma TiN
Data for plasma TiN collected at SNF.
Thermal HfO2 from Water
Data collected for HfO2 at SNF
Image Savannah HfO2 Monitors
Plasma HfO2
Thermal ZrO2
Data collected for thermal ZrO2 at SNF
File TiN XRD, XPS, and Resistivity Data from Fiji2 01/13
Data graciously provided by Joanie Ouyang
File TiN Roughness Data from SNF Fiji1 8/11
TiN Roughness Data from SNF Fiji1 8/11 graciously provided by Dr. J Provine and WooShik Jung
File Plasma Pt on Au SNF Fiji2 Chieh Chang
Plasma Pt recipe run at 270C on SNF Fiji2 by Chieh Chang Mar 2013
File Thermal Ru on GaAs Nanowire Xiaoxing Xu Fiji2
Data collected for Thermal Ru on GaAs Nanowire Xiaoxing Xu Fiji2 Mar 2013
Pt Data
Collection of user data from Pt films deposited at SNF
Ru Data
User data collected at SNF for Ru deposition
Image AFM of AlOx (Fiji1/200℃/500cycles/100cycle seasoning)
Image Woollam Profile of AlOx
Image Woollam MSE of AlOx
Image #33, Plasma AlOx MSE Woollam
Image #33, Plasma AlOx Profile Woollam
Image #27 AlOx AFM 250C Fiji2 lots seasoning 500 cycles
Image #27 AlOx Woollam Profile 250C Fiji2 lots seasoning 500 cycles
Image #27 AlOx Woollam MSE 250C Fiji2 lots seasoning 500 cycles
Image #25 Plasma HfOx 500cycles w/seasoning
Image #30 Plasma HfOx 500cycles w/100 seasoning Fiji1 250C
Image #25 Profile Plasma HfOx 500cycles w/seasoning
Image #30 MSE Plasma HfOx 500cycles w/100 seasoning Fiji1 250C
Image #25 MSE Plasma HfOx 500cycles w/seasoning
Image #30 MSE Plasma HfOx 500cycles w/100 seasoning Fiji1 250C
Image AlOx XPS N2 desiccated sample 250℃
Image Plasma AlOx air stored XPS
Image AlOx n2 and air stored Binding energy of carbon comparison
Image AlOx XPS air fiji1 sample 200℃
File ALD oxide AFM and wafer mapping
Fiji1 vs. Fiji2 Al2O3 and HfO2 film characterization by Kye Okabe
File Ta2O5 ALD development on Savannah
Recipe development data from Ieva Narkeviciute for Ta2O5 on Savannah using Tris(ethylmethylamido)tert-butylamido)tantalum(V) precursor. XPS composition results were: <0.1% carbon, 34.62% tantalum, and 65.38% oxygen
File HfO2 breakdown testing Savannah vs. Fijis
HfO2 breakdown voltage testing by Dr. Junghyun Park. Data from Sept-Oct 2014
Thermal Ta2O5
Data collected for thermal Ta2O5 at SNF
File Nickel Oxide from Accudep-Ni
Data collected by Ashwin Samarao for NiOx deposition using Accudep-Ni (Dow) precursor

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