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Plasma HfO2

Fiji1 vs. Fiji2 vs. Fiji3 vs. Savannah, Plasma vs. Thermal data

Thanks to Max Shulaker and Kye Okabe for the data in their EE412 Presentation and Report from Spring Quarter 2014.

Fiji2 vs. Savannah Breakdown Voltage data

Thank you to Dr. Junghyun Park for providing this data showing breakdown voltage of HfO2 films on Savannah vs. Fiji2.

Fiji1 vs. Fiji2, Plasma vs. Thermal data

Thank you to Kye Okabe for providing this data showing roughness and uniformity of Fiji1 and Fiji2 plasma and thermal Al2O3 and HfO2 films.

Surface roughness and uniformity characterization 

 

500 cycles of Plasma HfOx was deposited on a clean Si wafer. Surface roughness and uniformity was measured using AFM and Woollam, respectively by Kye Okabe (okabeATstanfordDOTedu). Data was obtained during February, 2014.  

Surface Roughness 

< 12 [nm] ...Temperature = 200 [℃] 
< 16 [nm] ...Temperature = 250 [℃]
*Temperature indicates the temperature of the Reactor Heater 1&2, Chuck Heater, and Cone Heater. 
 
Uniformity

Temperature = 200 [℃]
Mean: 625.31 [Å]
Min: 594.18 [Å]
Max: 642.18 [Å]
Std Dev: 13.799
Uniformity: 2.2067 [%] 
 
Temperature = 250 [℃]
Mean: 612.89 [Å]
Min: 588.83 [Å]
Max: 628.22 [Å]
Std Dev: 11.293
Uniformity: 1.8425 [%] 
 

*Note that roughly 14 [Å] of the thickness reported above is contributed by the native SiOx and is not HfOx.

 

#25 Plasma HfOx 500cycles w/seasoning

1.0x1.0 [μm] AFM Image of Plasma HfOx, 200 [℃], 500 [cycles] w/ [cycles] seasoning, Fiji1 

 

#30 Plasma HfOx 500cycles w/100 seasoning Fiji1 250C

1.0x1.0 [μm] AFM Image of Plasma HfOx, 250 [℃], 500 [cycles] w/100 [cycles] seasoning, Fiji 1

 

#25 Profile Plasma HfOx 500cycles w/seasoning

Woollam Thickness Profile of Plasma HfOx, 200 [℃], 500 [cycles] w/ seasoning, Fiji1


#30 MSE Plasma HfOx 500cycles w/100 seasoning Fiji1 250C

Woollam Thickness Profile of Plasma HfOx, 250 [℃], 500 [cycles] w/ 100 [cycles] seasoning, Fiji1

 
 #25 MSE Plasma HfOx 500cycles w/seasoning

Woollam Mean Squared Error (MSE) of Plasma HfOx, 200 [℃], 500 [cycles] w/ seasoning, Fiji1

 
#30 MSE Plasma HfOx 500cycles w/100 seasoning Fiji1 250C

Woollam Mean Squared Error (MSE) of Plasma HfOx, 250 [℃], 500 [cycles] w/ 100 [cycles] seasoning, Fiji1

 

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Data collected from Fiji1 (Fiji-L):

Plasma HfO2 Deposition rate of 1.01A/cycle for standard recipe at 200C

fiji-l thermal hafnia temp dependence   fiji-l plasma hafnia temp dependence

The breakdown voltage was found to be .4V/nm for plasma Hafnia films (no anneal) of thickness ~10nm.

Many thanks to Tim Holme and Cheng-Chieh Chao and the team at QuantumScape for the breakdown data.

 

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