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Films and Data

This page compiles the films available by atomic layer deposition at the Stanford Nanofabrication Facility and the characterization and monitoring data available for those films. If you are interested in particular films that do not appear here or characterization data for the films you do not see included here, please contact Michelle Rincon or J Provine. New film characterization data is welcome! Here is a template for providing information. Please email Michelle Rincon with any questions or data.

New film characterization data is welcome!  Here is a template for providing information.  Please email Michelle Rincon with any questions or data.

Film Precursor 1 Precursor 2
 Al2O3 Trimethylaluminum (CH3)3Al H2
 Al2O3 Trimethylaluminum (CH3)3Al  O2 Plasma 
 TiO2 Tetrakis(dimethylamido)titanium(IV) H2O
 TiO2 Tetrakis(dimethylamido)titanium(IV)
O2 Plasma
 TiN Tetrakis(dimethylamido)titanium(IV) N2 Plasma
 WN Bis(ter-butylimino)bis(dimethylamino)tungsten(VI)
N2 Plasma
HfO2
Tetrakis(dimethylamido)hafnium
H2O
HfO2
Tetrakis(dimethylamido)hafnium
O2 Plasma
ZrO2
Tetrakis(dimethylamido)zirconium(IV)
H2O
ZrO2
Tetrakis(dimethylamido)zirconium(IV)
O2 Plasma
Ta2O5
Pentakis(dimethylamido)tantalum(V) 
H2O
Ta2O5 Pentakis(dimethylamido)tantalum(V) 
O2 Plasma
TaN
Pentakis(dimethylamido)tantalum(V) 
H2 Plasma
SiO2
Tris[dimethylamino]Silane
O2 Plasma
Silicon Nitride
Tris[dimethylamino]Silane N2 plasma
Pt
Trimethyl(methylcyclopentadienyl)platinum(IV)
O2
Pt
Trimethyl(methylcyclopentadienyl)platinum(IV)
O2 Plasma
Ru
Bis(ethylcyclopentadienyl)ruthenium(II)
O2 and H2
NiO
bis(cyclopentadienyl)-nickel  
O2 Plasma
NiO
Nickel bis(N,N'-ditertialbutylacetamidinate) AKA Accudep-Ni
O2 plasma
ZnO
Diethylzinc
H2O
Silanization
APTES (3-Aminopropyl)triethoxysilane
 
In2O3
Cyclopentadienylindium(I)

GaN
Trimethylgallium
 
SnO2
Tetrakis(dimethylamido)tin
O2 plasma
 SrO  Bis(1,2,4-tritertiarybutylcyclopentadienyl)-strontium O2 plasma
 MoOx  Molybdenum hexacarbonyl
O2 plasma
     
     
     
     
     

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