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Plasma HfO2

Surface roughness and uniformity characterization 

 

500 cycles of Plasma HfOx was deposited on a clean Si wafer. Surface roughness and uniformity was measured using AFM and Woollam, respectively by Kye Okabe (okabeATstanfordDOTedu). Data was obtained during February, 2014.  

Surface Roughness 

< 12 [nm] ...Temperature = 200 [℃] 
< 16 [nm] ...Temperature = 250 [℃]
*Temperature indicates the temperature of the Reactor Heater 1&2, Chuck Heater, and Cone Heater. 
 
Uniformity

Temperature = 200 [℃]
Mean: 625.31 [Å]
Min: 594.18 [Å]
Max: 642.18 [Å]
Std Dev: 13.799
Uniformity: 2.2067 [%] 
 
Temperature = 250 [℃]
Mean: 612.89 [Å]
Min: 588.83 [Å]
Max: 628.22 [Å]
Std Dev: 11.293
Uniformity: 1.8425 [%] 
 

*Note that roughly 14 [Å] of the thickness reported above is contributed by the native SiOx and is not HfOx.

 

#25 Plasma HfOx 500cycles w/seasoning

1.0x1.0 [μm] AFM Image of Plasma HfOx, 200 [℃], 500 [cycles] w/ [cycles] seasoning, Fiji1 

 

#30 Plasma HfOx 500cycles w/100 seasoning Fiji1 250C

1.0x1.0 [μm] AFM Image of Plasma HfOx, 250 [℃], 500 [cycles] w/100 [cycles] seasoning, Fiji 1

 

#25 Profile Plasma HfOx 500cycles w/seasoning

Woollam Thickness Profile of Plasma HfOx, 200 [℃], 500 [cycles] w/ seasoning, Fiji1


#30 MSE Plasma HfOx 500cycles w/100 seasoning Fiji1 250C

Woollam Thickness Profile of Plasma HfOx, 250 [℃], 500 [cycles] w/ 100 [cycles] seasoning, Fiji1

 
 #25 MSE Plasma HfOx 500cycles w/seasoning

Woollam Mean Squared Error (MSE) of Plasma HfOx, 200 [℃], 500 [cycles] w/ seasoning, Fiji1

 
#30 MSE Plasma HfOx 500cycles w/100 seasoning Fiji1 250C

Woollam Mean Squared Error (MSE) of Plasma HfOx, 250 [℃], 500 [cycles] w/ 100 [cycles] seasoning, Fiji1

 

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Data collected from Fiji1 (Fiji-L):

Plasma HfO2 Deposition rate of 1.01A/cycle for standard recipe at 200C

fiji-l thermal hafnia temp dependence   fiji-l plasma hafnia temp dependence

The breakdown voltage was found to be .4V/nm for plasma Hafnia films (no anneal) of thickness ~10nm.

Many thanks to Tim Holme and Cheng-Chieh Chao and the team at QuantumScape for the breakdown data.

 

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