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EE412 Final Reports

This page presents final reports form the EE412 class that involve ALD tools.

 

 Areas of Interest
Project Name
 Primary Lab Tools Used
 Researcher and (Mentor)
Date
Hydrophilic (ODS) and Hydrophobic (DETA) SAMS deposition on Pyrex and Si, uniformity and film quality
Molecular Vapor Deposition and Patterning of Organosilane Self-Assembled Monolayers for Directed Growth of Neuron Cells
MVD Felix Alfonso and Hsin-Ya Lou
(Michelle Rincon)
(J Provine)
6/2014
 ALD nitride films
 Development of Four Nitride Films; TiN, Hf3N4, WN, and AlN
 Savannah Shingo Yoneoka, Yi-Hsuan, Scott Lee and Chu-En Chang
(J Provine)
 12/2010
 ALD metal-nitride films
 Characterization of metal-nitride films deposited by the Savannah ALD system
 Savannah  Adair Gerke and Suhas Kumar
(J Provine)
(Krishna Saraswat)
 6/11
ALD HfO2 and Al2O3 films
 ALD Nanolaminates
 Savannah  Yi Wu, Shimeng Yu, and Shuang Li
(J Provine)
 12/2010
 Faster, better ALD TiN films
 TiN Characterization
 Fiji1
 Fiji2
 XPS
 Kye Okabe
Max Shulaker
(Michelle Rincon)
(J Provine)
 6/2014
Conformal AlO3, Hf2 and ZrO2
 ALD for Conformal and High Aspect Ratio Coverage
 Fiji1
Fiji2
Savannah
XeF2
 Wanki Kim and Insun Park
(J Provine)
 3/2011
 Conformality of ALD films; Al2O3, TiN and Pt
 Characterization of Fiji ALD Film Quality and Conformality in High Aspect Ratio/Deep Etched Structures
 Fiji1
Fiji2
Savannah
 Insun Park, Jooyong Sim and Young Ik Sohn
(J Provine)
 12/2011
 High-k dielectrics, Al2O3, HfO, MOSCAP
 ALD Dielectric Electrical Characterization
 Fiji1
Fiji2
Fiji3
Savannah
 Max Shulakar
(Michelle Rincon)
(J provine)
 6/2014
 Charge density study for HfO2 and Al2o3
 High-k/SiO2 interface Charge Characterization for ALD tools
 Savannah  Hong-Yu Chen and Luckshitha
(J Provine)
 3/2011
 Corrosive resistant ALD films; Al2O3, HfO2 and ZrO2
 Corrosive Resistant ALD Coatings
 Savannah  Joseph Doll and Alexandre Haemmerli
(J Provine)
 6/11

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