Skip to content. | Skip to navigation

Sections
Personal tools
You are here: Home / Equipment / Chemical Vapor Deposition / ALD / Fiji1

Fiji1

Fiji1 is a load-locked, plasma-enabled atomic layer deposition (ALD) system. Coupled with Fiji2, Fiji1 is a Fiji F202 system from Cambridge Nanotech and is used for plasma assisted ALD of various dielectric and metallic films. The system can accommodate pieces up to an 8" wafer. Fiji1 is currently classified as semi-clean. (Please be patient as the images load.)

Document Actions