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Fiji2 is a load-locked, plasma-enabled atomic layer deposition (ALD) system. Coupled with Fiji1, Fiji2 is a Fiji F202 system from Cambridge Nanotech and is capable of both thermal and plasma assisted ALD of various dielectric and metallic films. The system can accommodate pieces up to an 8" wafer. Fiji2 is currently classified as gold contaminated and is open to a wide range of materials. (Please be patient as the images load.)

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