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Sidewall epitaxial piezoresistor process and characterisation for in-plane force sensing applications
Room temperature 1.6 μm electroluminescence from Ge light emitting diode on Si substrate
Effects of hydrogen annealing on heteroepitaxial-Ge layers on Si: Surface roughness and electrical quality
Ge on Si by Novel Heteroepitaxy for High Efficiency Near Infrared Photodetection
Fabrication of High-Quality p-MOSFET in Ge Grown Heteroepitaxially on Si
High-efficiency metal–semiconductor–metal photodetectors on heteroepitaxially grown Ge on Si
Defect Reduction of Ge on Si by Selective Epitaxy and Hydrogen Annealing
Low-Temperature, LPCVD and Solid Phase Crystallization of Silicon–Germanium Films
Effect of Isochronal Hydrogen Annealing on Surface Roughness and Threading Dislocation Density of Epitaxial Ge on Si
Germanium In Situ Doped Epitaxial Growth on Si for High-Performance n+/p Junction Diode
Germanium In Situ Doped Epitaxial Growth on Si for High-Performance n+/p-Junction Diode
High-Efficiency p-i-n Photodetectors on Selective-Area-Grown Ge for Monolithic Integration
High Performance n-MOSFETs with Novel Source/Drain on Selectively Grown Ge on Si for Monolithic Integration
Effect of isochronal hydrogen annealing on surface roughness and threading dislocation density of epitaxial Ge films grown on Si
Low Temperature Germanium Growth on Silicon Oxide Using Boron Seed Layer and In Situ Dopant Activation
Description of Wafer Holder
Characterization of a Time Multiplexed Inductively Coupled Plasma Etcher
Effect of wafer holder on etch profiles & grass
15% Arsine 85% Nitrogen
Argon
Boron Trichloride
Boron Trifluoride
Carbon Dioxide (Matheson)
Carbon Dioxide (Praxair)
Chlorine
Disilane
Dichlorosilane
Halocarbon 14
Halocarbon 23
Halocarbon 22
Halocarbon 116
Helium
Hydrogen Bromide
Methane
Nitrogen Trifluoride
Nitrogen
Nitrous Oxide (Air Products)
Nitrous Oxide (Praxair)
Boron Tribromide (BBr3)
Silane (Air Products)
Silane (Praxair)
Silicon Tetrachloride
Sulfur Hexafluoride (Praxair)
Sulfur Hexafluoride (Air Products)
Ultrasol 2EX MSDS
Ultrasol S10 MSDS
A-174 Silane
MICRO-90 CONCENTRATED CLEANING SOLUTION
Parylene Dimer DPX-C
TrimethylAluminum
Tetrakis(dimethylamido)titanium(IV) (TDMA-Ti) MSDS
Bis(ter-butylimino)bis(dimethylamino)tungsten(VI) MSDS
Tetrakis(dimethylamido)hafnium(IV) MSDS
Tungsten Hexacarbonyl W(CO)6
Tetrakis(dimethylamido)zirconium(IV) (TDMA-Zr) MSDS
Tetrakis(ethylmethylamido)zirconium(IV) (TEMA-Zr) MSDS
Tris(diethylamido)(tert-butylimido)tantalum(V)
Tris[dimethylamino]Silane (3DMAS) MSDS
(3-Aminopropyl)triethoxysilane (APTES) MSDS
Tris(tert-botoxy)silanol MSDS
Trimethyl(methylcyclopentadienyl)platinum(IV) MSDS
Bis(cyclopentadienyl)nickel (nickelocene) MSDS
Bis(ethylcyclopentadienyl)ruthenium(II) MSDS
Diethylzinc (DEZ) MSDS
Tris[N,N-bis(trimethylsilyl)amide]yttrium MSDS
Cyclopentadienyl-indium MSDS
Tetrakis(dimethylamino)tin(IV) TDMA-Sn MSDS
Tris(cyclopentadienyl)yttrium (3CpY) MSDS
Tetramethyl-Tin
Trimethylgallium
Bis(1,2,4-triteriarybutylcyclopentadienyl)-strontium
Bis(ethylcyclopentadienyl)nickel(II) MSDS
Ferrocene
Titanium (IV) Isopropoxide (TTIP) MSDS
Bis(n-propyltetramethycyclopentadienyl)barium MSDS
Bis(pentamethylcyclopentadienyl)barium, 1,2-dimethoxyethane adduct MSDS
Bis(cyclopentadienyl)cobalt (II) MSDS
Fe amidinate MSDS (Accudep Iron)
Pentakis(dimethylamino)tantalum(V)
MSDS Nickel bis(N,N'- ditertialbutylacetamidinate) AKA Dow Accudep-Ni
MSDS- Molybdenum hexacarbonyl
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ThermcoNitride
Silicon nitride (or nitride or Si3N4) is deposited at moderately high temperatures (~800C) and low pressure (~250 mtorr), using dichlorosilane (SiCl2H2) and ammonia (NH3). This furnace handles wafer up to 6 inch.
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Etch Profiles
Semiclean Wafers on lampoly/p5000etch Poly
Throttle vs Pressure for SF6 and C4F8
Emergency Map (gif)
Wbexfab_solv hot plate controller programming