Metal Layer H2SO4 Etch
|Recipe||Run time||Film thickness|
|SiO 300-1||2 min||0.16 µm|
|SiO 350-1||2 min||0.16 µm|
|SiN 300-1||3 min||0.045 µm|
|SiN 350-1||3 min||0.045 µm|
The experiment demonstrated the degradation of the film in the area of tweezers- handling (flat edge).
Moreover, a few hypotheses can be raised to explain the discoloration observed in the SiN 300-1 film. One, the discoloration could have been caused by the degradation of the film itself in contact with the H2SO4 bath. This would indicate the film has a less stable and resistance structure than the other films. Two, the discoloration could have been caused by a superficial or shallow etching by the chemical bath of the metal layer. This would indicate the film presented more pinholes than the other films across areas not degraded by handling.