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Summary of SiO2 Quick Check

Quick checks are run to look at the functionality of the tool in a timely manner. Data taken are; Average thickness (for SiO2 2 min dep), Standard Dev., Refractive Index, % uniformity and Deposition Rate. Reasons for the quick check are given in the comments.

CCP PECVD Quick Check for SiO2

 

12 May 2014

 

Recipe SiO350-1 for 2 mins

Wafer Position
Average Thickness
Standard Dev.
Refractive Index
% Uniformity
Dep Rate
1 1528A 26.3 1.4577 2.7 764A/min
2 1516 36.3 1.4577 3.8 758
3 1524 31.6 1.4574 3.4 762
4 1518 33.3 1.4576 3.6 759

Comments; Clean & coat run before dep, user reported bad uniformity.

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