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HDPECVD Recipes

This folder contains copies of recipes used on the HDPCVD system. This gives us a record of the original recipe parameters.
HDP_SiNx
Here is a copy of the recipe HDP_SiNx
HD_SiO2
Here is a copy of the recipe HD_SiO2.
HDP_Etchback
Here is a copy of the recipe HDP_Etchback. It is used for endpoint determined etching of the process module (chamber). The recipe should be run when there is 3.5-4.0um accumulated deposition or when a user wants to keep their samples in clean status.

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