This folder contains copies of recipes used on the HDPCVD system. This gives us a record of the original recipe parameters.
- Here is a copy of the recipe HDP_SiNx
- Here is a copy of the recipe HD_SiO2.
- Here is a copy of the recipe HDP_Etchback. It is used for endpoint determined etching of the process module (chamber). The recipe should be run when there is 3.5-4.0um accumulated deposition or when a user wants to keep their samples in clean status.