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HD_SiO2

Here is a copy of the recipe HD_SiO2.

HDP_SiO2

 

Parameter

1:Ox1
Thermal Soak

2:Ox2
Gas Stabilize
3:Ox3
Light Step
4:Ox4
Dep Step
5:Ox5
N2+N2 Flush


Process Time
30
30
6
Varied
15


Over Etch Time Percent
0
0
0
0
0


Pressure/Position Evacuation Condition
#pressure
#pressure #pressure #pressure #pressure

Pressure 10
10
10
10
15


Throttle Valve Position Set Point
0.0
0.0
0.0
0.0
0.0


Process End Condition
#Time
#Time #Time #Time T#ime

Recipe Restart Sequence Name







Recipe Abort Sequence Name






N2a
20
0
0
0
25


SF6 0
0
0
0
0


O2
0
56
56
56
0


Ar
50
20
20
20
0


 N2b 0
0
 0  0 0

 
 N2c 0
0
 0  0  0
 
 SiH4 0
 28 28
 28 0
 
 N2d 0
0
0
 0 25
 
He Cooler Mode
#pressure #pressure #pressure #pressure #pressure

He Cooler Pressure Setpoint
4000.0
4000.0 4000.0 4000.0 4000.0

He Cooler Flow Setpoint 0.0
0.0
0.0
0.0
0.0


Bias RF Forward Setpoint
0
0
25
25
0


IPC Forward Power Setpoint
0
0
600
600
0


 Bias Match Control Mode #man-auto
 #automatic  #automatic  #automatic  #automatic    
 Bias Match Load Position  50  0 0
 0  0    
 Bias Match Tune Position  50  0 0
 0  0    
IPC Match Control Mode
#man-auto #automatic #automatic #automatic #automatic

IPC Match Load Position
45
0
0
0
0


IPC Match Tune Position 60
0
0
0
0


Temperature Electrode Setpoint
90
90
90
90 90


Temperature Lid Setpoint 90
90
90
90
90

Temperature Spool Setpoint 90
90
90
90
90


Execute if later Step Restarted
False
False False False False

External Detector Endpoint Recipe Name
#none #none #none #none #none

No Endpoint found alarm severity
#warning
#warning  #warning #warning #warning

 IPC RF Reflected Power Error Timeout
     

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