Quals are run on a regular basis, when major maintenance/repairs are performed or to check a labmember reported problem. Included in the folder are 1) Qual Procedure 2) recent SiO Results and 3) recent SiNx results. Deposition rate, refractive index, within-a-wafer uniformity, film stress and HF etch rates are given.
- Qual Procedure
- The procedure for running the qual on the HD PECVD system is outlined. Interested labmembers are encouraged to run a qual. Lab Staff will run quals at a regular intervals or as problems with the tool are reported.
- SiO Qual results- HD PECVD
- Qual results for SiO thin films are posted here and noted in the lab management software for the tool.
- SiNx Qual results- HD PECVD
- Recent quals results for SiNx thin films are posted here and on the lab management software system.