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AMT 8100 Plasma Etcher, amtetcher (semi-clean)

The amtetcher is a Reactive Ion Etcher that uses fluorine based chemistry to etch Oxides or Nitrides. Also can be used for Si trench etching.

AMT 8100 Plasma Etcher, amtetcher

The Applied Materials Technologies 8100 Hexode plasma etcher.

AMT 8100 Plasma Etcher, amtetcher - Read More…

Amtetcher Quick Start

Quick starts are a distillation of the more verbose Operating Instructions. The user of the tool should have read and understood the full Operating Instructions for the etcher.

Amtetcher Quick Start - Read More…

Standard Recipes and Etch Rates

This table shows the etch rates for various material when using the standard recipes.

Standard Recipes and Etch Rates - Read More…

NEW! Recent qualification Results

Recent qual results for oxide, photoresist single crystal and poly silicon, and nitride etch rates and selectivities are given for quick reference.

NEW! Recent qualification Results - Read More…

Non-Standard and Lesser Used Recipes

This page contain recipes for the Amtetcher which are not used as often as the standard recipes. They may require the labmember to program the tool for their use. Additionally, these recipes have not be characterized so there will not be a list of etch rates for various materials included. Labmembers are encouraged to measure baseline etch ates for the materials to be etched.

Non-Standard and Lesser Used Recipes - Read More…

Fine Example of RF arcing

The following pictures show what happens when the trays are not properly latched. Please contact the responsible staff member for more information.

Fine Example of RF arcing - Read More…

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