Sidewall epitaxial piezoresistor process and characterisation for in-plane force sensing applications
Etch Profiles
Semiclean Wafers on lampoly/p5000etch Poly
Throttle vs Pressure for SF6 and C4F8
Matlab File: 49 point wafer mapping
Optical Microscopy for Labmembers Working at SNF
Emergency Map (gif)
W-etching-Week3
Hydrochloric Acid 37%
KS Mask Aligner Training
Applied Materials Precision 5000 Etcher, p5000etch (semi-clean)
Applied Materials Precision 5000 Etcher, p5000etch
The Applied Materials Precision 5000 Etcher is a "cluster" tool, consisting of four, independently-controlled etch chamber modules which surround a central loadlock. Chambers A, B, and C are Magnetically-Enhanced Reactive Ion Etch (MERIE) systems, each equipped with optical endpoint detection to allow for more customized etching. The chamber configuration and system software allow control over a wide range of process parameters.
Quick Start for P5000etch
Quick starts are handy references of the Operating Instructions. They can be helpful for reminding the user on how to use the tool. Labmembers should have read and understood the full Operating Instructions.
NEW! Recent Process Qualifications
Recent qualifications for all three chambers are given for quick reference.
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