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You are here: Home / Equipment / Dry Etching / Applied Materials Precision 5000 Etcher, p5000etch (semi-clean) / NEW! Recent Process Qualifications

NEW! Recent Process Qualifications

Recent qualifications for all three chambers are given for quick reference.

Recent process qualifications by chamber and date.

 

Chamber A (metal)

 

15 Jan 2014

After annual winter shutdown.

Al/Si
Etch Rate
PR (3612)
Etch Rate
Oxide
Etch Rate
Single Crystal
Etch Rate
Al/Si : PR
Selectivity
Al/Si : Ox
Selectivity
Al/Si : Si
Selectivity

2358A/min
(may need to be re-tested)

3087
596
2860
0.76 : 1
4.0 : 1
0.82 : 1

 

 

 15 Jan 2013

After annual winter shutdown.

Al/Si
Etch Rate
PR (3612)
Etch Rate
Oxide
Etch Rate
Single Crystal
Etch Rate
Al/Si : PR
Selectivity
Al/Si : Ox
Selectivity
Al/Si : Si
Selectivity

5614A/min

3479
546
3341
1.6 : 1
11.3 : 1
1.7 : 1

 

  30 Mar 2012


 Quick check of metal etch;

Al etch rate = 5277A/min without Break Though Step

Al etch rate = 5598A/min with Break Though Step

 

  18 Feb 2011

 

Al/Si
Etch Rate
PR (3612)
Etch Rate
Oxide
Etch Rate
Single Crystal
Etch Rate
Al/Si : PR
Selectivity
Al/Si : Ox
Selectivity
Al/Si : Si
Selectivity

1.083um

4138
641
3495
2.6 : 1
16.9 : 1
3.1 : 1

 

 

23 Sept 2010

 

Al/Si
Etch Rate
PR (3612)
Etch Rate
Oxide
Etch Rate
Single Crystal
Etch Rate
Al/Si : PR
Selectivity
Al/Si : Ox
Selectivity
Al/Si : Si
Selectivity
7482

3951
897
3988
1.9 : 1
8.4 : 1
1.9 : 1

 

20 Jan 2010

 

Al/Si
Etch Rate
PR (3612)
Etch Rate
Oxide
Etch Rate
Single Crystal
Etch Rate
Al/Si : PR
Selectivity
Al/Si : Ox
Selectivity
Al/Si : Si
Selectivity
7684
7395 (20 Jan 2010)
4528
1255 4039
1.7 : 1
6.1 : 1
1.9 : 1

 

23 Oct 2009

Al/Si
Etch Rate
PR (3612)
Etch Rate
Oxide
Etch Rate
Single Crystal
Etch Rate
Al/Si : PR
Selectivity
Al/Si : Ox
Selectivity
Al/Si : Si
Selectivity
7333 3398 1240 3424 2.2 : 1
6.0 : 1
2.1 : 1

 

2 Oct 2009

Al/Si
Etch Rate
PR (3612)
Etch Rate
Oxide
Etch Rate
Single Crystal
Etch Rate
Al/Si : PR
Selectivity
Al/Si : Ox
Selectivity
Al/Si : Si
Selectivity
7320 3224 1306
-
2.3 : 1
5.6 : 1
-

 

Chamber B (oxide)

 

15 Jan 2014

Thermal Ox
Etch Rate
PR (3612)
Etch Rate
Nitride
Etch Rate
Poly Si
Etch Rate
Single Crystal
Etch Rate
Ox : PR
Selectivity
Ox : Nitride
Selectivity
Nitride : PR
Selectivity
3229
1874
>2324
1108
 863 1.7: 1
>1.4 : 1
>1.2 : 1

 

 

 

15 Jan 2013

Thermal Ox
Etch Rate
PR (3612)
Etch Rate
Nitride
Etch Rate
Poly Si
Etch Rate
Single Crystal
Etch Rate
Ox : PR
Selectivity
Ox : Nitride
Selectivity
Nitride : PR
Selectivity
3647
1925


 799 1.9: 1


 

 

24 Feb 2012

Thermal Ox
Etch Rate
PR (3612)
Etch Rate
Nitride
Etch Rate
Poly Si
Etch Rate
Single Crystal
Etch Rate
Ox : PR
Selectivity
Ox : Nitride
Selectivity
Nitride : PR
Selectivity
3530
1800

1010
 750 2.0 : 1


 

 

18 Feb 2011

Ox
Etch Rate
PR (3612)
Etch Rate
Nitride
Etch Rate
Poly Si
Etch Rate
Single Crystal
Etch Rate
Ox : PR
Selectivity
Ox : Nitride
Selectivity
Nitride : PR
Selectivity
3559
1728
2994
1079
 724 2.1 : 1
1.2 : 1
1.7 : 1

 

23 Oct 2009

Ox
Etch Rate
PR (3612)
Etch Rate
Nitride
Etch Rate
Single Crystal
Etch Rate
Ox : PR
Selectivity
Ox : Nitride
Selectivity
Nitride : PR
Selectivity
3063
1521
3024
-
2.0 : 1
1.01 : 1
2.0 : 1

 

24 Sept 2009

Comments; after CH3 cylinder replacement- new vendor.

Ox
Etch Rate
PR (3612)
Etch Rate
Nitride
Etch Rate
Single Crystal
Etch Rate
Ox : PR
Selectivity
Ox : Nitride
Selectivity
Nitride : PR
Selectivity
3131
1605
3032

1.95 : 1
1.03 : 1
1.89 : 1

 

Chamber C (Poly, Si)

 

27 Mar 2014- quick check after chiller unclogged

Poly
Etch Rate
PR (3612)
Etch Rate
Ox
Etch Rate
Single Crystal
Etch Rate
Poly : PR
Selectivity
Poly : Ox
Selectivity
Poly : Si
Selectivity

529

2320



 

 

15 Jan 2014

Poly
Etch Rate
PR (3612)
Etch Rate
Ox
Etch Rate
Single Crystal
Etch Rate
Poly : PR
Selectivity
Poly : Ox
Selectivity
Poly : Si
Selectivity
2961
434

2312
6.8 : 1

1.3 : 1

 

 

22 April 2013

Poly
Etch Rate
PR (3612)
Etch Rate
Ox
Etch Rate
Single Crystal
Etch Rate
Poly : PR
Selectivity
Poly : Ox
Selectivity
Poly : Si
Selectivity
2997

269


11 : 1

 

15 Jan 2013

Poly
Etch Rate
PR (3612)
Etch Rate
Ox
Etch Rate
Single Crystal
Etch Rate
Poly : PR
Selectivity
Poly : Ox
Selectivity
Poly : Si
Selectivity
3352
592
306
2674
5.7 : 1
7.4 : 1
1.3 : 1

 

29 March 2012

Poly
Etch Rate
PR (3612)
Etch Rate
Ox
Etch Rate
Single Crystal
Etch Rate
Poly : PR
Selectivity
Poly : Ox
Selectivity
Poly : Si
Selectivity
2920
603
306
2404
4.8 : 1
9.5 : 1
1.2 : 1

 

 

 

16 Feb 2011

Poly
Etch Rate
PR (3612)
Etch Rate
Ox
Etch Rate
Single Crystal
Etch Rate
Poly : PR
Selectivity
Poly : Ox
Selectivity
Poly : Si
Selectivity
4740
597
442
3021
7.9 : 1
10.7 : 1
1.6 : 1

 

 

10 Jan 2010

Poly
Etch Rate
PR (3612)
Etch Rate
Ox
Etch Rate
Single Crystal
Etch Rate
Poly : PR
Selectivity
Poly : Ox
Selectivity
Poly : Si
Selectivity
3147
467
440
2302
6.7 : 1
7.2 : 1
1.4 : 1

 

 

23 Oct 2009

Poly
Etch Rate
PR (3612)
Etch Rate
Ox
Etch Rate
Single Crystal
Etch Rate
Poly : PR
Selectivity
Poly : Ox
Selectivity
Poly : Si
Selectivity
3181
627
545
2482
5.1 : 1
5.8 : 1
1.3 : 1

 

2 Oct 2009

Poly
Etch Rate
PR (3612)
Etch Rate
Ox
Etch Rate
Single Crystal
Etch Rate
Poly : PR
Selectivity
Poly : Ox
Selectivity
Poly : Si
Selectivity
2819
559
447
-
5.0 : 1
6.3 : 1
-

 

 

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