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Drytek2 Model 100, drytek2 (semiclean)

Drytek2 Model 100, drytek2

The Drytek plasma etchers at SNF all use chlorine and fluorine-based chemistry for etching various Si, polysilicon, nitride, tungsten, tungsten silicide films. Drytek4 (contaminated) also has additional capabilities for oxide etching and argon sputter etching.

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Drytek2 Quick Start Instructions

Quick Start Instructions allow user to have a handy condensed version of the Operating Instructions. The user, however, is responsible for having read and understood the full version of the machine operating instructions.

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Procedure for Balancing RF Power to Electrodes

This procedure is to be performed by maintenance staff. The purpose is to balance electrode power to yield as consistent etch performance across all electrodes as possible.

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