Skip to content. | Skip to navigation

Sections
Personal tools
You are here: Home / Equipment / Dry Etching / Drytek4 Model 100 (modified), drytek4 (contaminated)

Drytek4 Model 100 (modified), drytek4 (contaminated)

Drytek4 Model 100 (modified), drytek4

The Drytek plasma etchers at SNF all use chlorine and fluorine-based chemistries for etching various Si, polysilicon, nitride, tungsten, tungsten silicide films. Drytek4 iis a contaminated etcher. It has been modified to use a single electrode. Drytek4 (contaminated) also has additional capabilities for oxide etching and argon sputter etching.

Drytek4 Model 100 (modified), drytek4 - Read More…

Drytek4

Drytek4

Image of Drytek 4 dry etcher

Drytek4 - Read More…

Document Actions