Drytek4 Model 100 (modified), drytek4 (contaminated)
The Drytek plasma etchers at SNF all use chlorine and fluorine-based chemistries for etching various Si, polysilicon, nitride, tungsten, tungsten silicide films. Drytek4 iis a contaminated etcher. It has been modified to use a single electrode. Drytek4 (contaminated) also has additional capabilities for oxide etching and argon sputter etching.
Etch rates for different recipes
Image of Drytek 4 dry etcher