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Gasonics Plasma Asher

The Gasonics Aura Asher is an automated upstream microwave plasma system used for stripping photoresist of clean 4 inch silicon wafers. The system generates a plasma of oxygen and nitrogen in a reaction chamber. This reactive mixture flows downstream to the process chamber where it reaches a state of “afterglow,” where it is highly reactive and no longer electrically active or damaging to the wafer surface. The dissociated oxygen chemically reacts with the photoresist effectively burning the resist off the wafer.

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