Matrix Plasma Asher, matrix (contaminated)
The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination of oxygen plasma, high power, higher pressure and a heated chuck (platen).
The matrix has recently undergone a major software upgrade. This quick start is offered as a stop-gap so that labmembers can use the tool as more detailed operating instructions are written.
Be aware that Cr can be etched in the matrix.