Matrix Plasma Asher, matrix (contaminated)
The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination of oxygen plasma, high power, higher pressure and a heated chuck (platen).
Quick start instructions are a distillation of the longer more verbose Operating Instructions. Be aware that the user of the asher should have read and understood the Operating Instructions.
Be aware that Cr can be etched in the matrix.