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You are here: Home / Equipment / Dry Etching / MRC Model 55 RIE, mrc (contaminated) / Qual results

Qual results

This folder contains results of qualification tests using various recipes.

Ar Sputter Etch Qual Results

Standard Ar recipe used for 10 minutes on thermal oxide wafers; Ar 15sccm, 12.5mT, 100W, 600-700pV; quartz insulator plate not used, quartz corral ring used to keep wafers centered. This recipe is a quick check that gives us a good idea of machine functionality.

Ar Sputter Etch Qual Results - Read More…

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