Skip to content. | Skip to navigation

Personal tools
You are here: Home / Equipment / Dry Etching / Oxford III-V Etcher

Oxford III-V Etcher

The Oxford Instruments PlasmaPro System 100 Cobra III-V Etcher was acquired in late 2011 for precision etching of III-V compounds. It is currently approved to etch GaAs, InGaAs, InAs, InP, InGaAsP, and GaP only. Please contact Jim McVittie ( for approval to etch other substrates.

Operating Instructions- Ox-35

Here are operating instructions for the Ox-35 etcher. They come courtesy of superuser Alex Piggott. Yunhan Chen expanded the instructions to include procedures for recipe set up.

Operating Instructions- Ox-35 - Read More…


This folder contains reports from studies, EE412 and interested labmembers.

Characterization - Read More…

Document Actions