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Oxford III-V Etcher

The Oxford Instruments PlasmaPro System 100 Cobra III-V Etcher was acquired in late 2011 for precision etching of III-V compounds. It is currently approved to etch GaAs, InGaAs, InAs, InP, InGaAsP, and GaP only. Please contact Jim McVittie (mcvittie@stanford.edu) for approval to etch other substrates.

Operating Instructions- Ox-35

Here are operating instructions for the Ox-35 etcher. They come courtesy of superuser Alex Piggott.

Operating Instructions- Ox-35 - Read More…

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