PlasmaTherm Deep Silicon Etcher (pt-dse)
PT-DSE is an ICP (Inductively Coupled Plasma) etch system configured for Si etches using Bosch process. This equipment belongs to the "Contaminated" group.
Process steps are added together to create process sequences for Versaline tools. This process step is specific to the DSE tool. It lists all the parameters and their limits to be used in recipe writing.
This folder contains the site acceptance report and data created during the initial recipe development phase.
The DSE can be used to etch shallow trenches or thin poly/amorphus Si structures. The profile and sidewall result can be an issue depending on customer needs.
Super user characterizations
The folder contains some recipes commonly used int eh PlamaTherm Deep Silicon Etcher.