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Shallow Silicon Etch Recipe Development Efforts

The DSE can be used to etch shallow trenches or thin poly/amorphus Si structures. The profile and sidewall result can be an issue depending on customer needs.

Nano Recipe Results (from Ludwig Galambos)

Std Nano Recipe (April 1, 2016); No morphing; Data from 9um line/ 9um space & 4um line/4um space gratings - 500 cycles

Nano Recipe Results (from Ludwig Galambos) - Read More…

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