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Vendor Start-up Raw Repeatability

Run No.

    Run1

     Run2

    Run3

    Run4

    Run5

Average SiO2 Etched

    5207

    5236

    5222

    5320

    5244

Average PR etched

    4751

    4936

    4576

    4639

    4370

SiO2 Etch Rate

    2604

    2618

    2611

    2660

    2622

Selectivity (SiO2:PR)

    1.10

    1.06

    1.14

    1.15

    1.20

With In wafer Non-Uniformity

    0.44

    0.59

    0.58

    0.55

    0.40

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