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This folder contains studies, EE412 Project reports and special project information by interested Labmembers.

EE412 Reports

Links to EE412 reports are found on this page.

EE412 Reports - Read More…

Silicondioxide Etch Characterization

Comparison of CHF3/O2 and C4F8/Ar/O2 processes - Data provided by Ken Leedle and summarized by Yunhan Chen

Silicondioxide Etch Characterization - Read More…

SiO2 Etching with Chrome Hard Mask

Si wafers with PECVD SiO2 (ccpdep). Data provided by Noureddine Tayabi

SiO2 Etching with Chrome Hard Mask - Read More…

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