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seO2 Clean-1 Recipe

The seO2 Clean-1 recipe is used to clean polymer from the chamber. It is suggested that users of the etcher run the recipe between each etch.

seO2 Clean-1 Recipe

 

 

Parameter
1:seO2 Clean1
Gas Stabilize
2:seO2 Clean2
lgn
3:seO2-EP Clean3
Main Etch
4:seO2-EP Clean4
Over Etch




Process Time
10.0
5.0
3600.0
300.0




Over Etch Time Percent
0
0
0
0




Pressure/Position Evacuation Condition
#pressure
#pressure #pressure #pressure



Pressure 20.0
20.0 20.0 20.0



Throttle Valve Position Set Point
100.0
100.0 100.0 100.0



Process End Condition
#Time
#Time #Endpoint Detector
#Time



Recipe Restart Sequence Name








Recipe Abort Sequence Name







C4F8
0
0
0
0




H2
0
0
0
0




AR
0
0
0
0




CF4
0
0
0
0




O2 50.0
50.0
50.0
50.0




CHF3 0
0
0
0




 He 0
0
0
0




 N2 0
0
0
0




He Cooler Mode
#pressure #pressure #pressure #pressure



He Cooler Pressure Setpoint
4000.0
4000.0 4000.0 4000.0



He Cooler Flow Setpoint 0
0
0
0




Bias RF Forward Setpoint
0
100
10
10




IPC Forward Power Setpoint
0
800
800
800




 Bias Match Control Mode #default
#auto
#auto #auto



 Bias Match Load Position 0
0
0
0




 Bias Match Tune Position 0
0
0
0




IPC Match Control Mode
#default #auto #auto #auto



IPC Match Load Position
0
0
0
0




IPC Match Tune Position 0
0
0
0




Temperature Electrode Setpoint
10
10
10
10




Temperature Lid Setpoint 90
90 90 90



Temperature Spool Setpoint 70
70
70
70




Execute if later Step Restarted
?
?
?
?




External Detector Endpoint Recipe Name
#none
#none
#'o2clean.ewr'
#none




No Endpoint found alarm severity
#error
#error #error #error



 Camera Mode Setpoint
#none
#none #none #none



 Bias RF Power Error Timeout
10000
10000 10000 10000



 IPC RF Reflected Power Error Timeout
10000 10000 10000 10000



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