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O2 Clean 1

This is an O2 clean recipe to be used before critical etches or running the quals on the tool.

 

O2 Clean 1

 

Parameter
1: O2 Clean 1
Gas Stab
2: O2 Clean 2
lgn
3: O2 Clean 3
Main Etch





Process Time
10
5
1800





Over Etch Time Percent
0
0
0





Pressure/Position Evacuation Condition
#Pressure
#Pressure #Pressure




Pressure 20.0
20.0
20.0





Throttle Valve Position Set Point
100.0
100.0
100.0





Process End Condition
#Time
#Time #Time




Recipe Restart Sequence Name








Recipe Abort Sequence Name







Cl2
0
0
0





BCl3
0
0
0





O2
50
50
50





SF6
0
0
0





Ar
0
0
 0



 
CF4 0
0
 0
 


CH4
0
0
0





N2 0
0
0
 



He Cooler Mode
#Pressure #Pressure #Pressure




He Cooler Pressure Setpoint
3000.0
3000.0
3000.0





He Cooler Flow Setpoint 0
0
0





Bias RF Forward Setpoint
0
100.0
10.0





IPC Forward Power Setpoint
0
800.0
800.0





 Bias Match Control Mode  #Default
 #Auto  #Auto          
 Bias Match Load Position  0  0 0
         
 Bias Match Tune Position  0  0 0
         
IPC Match Control Mode
 #Default #Auto #Auto




IPC Match Load Position
0
0
0





IPC Match Tune Position 0
0
0





Temperature Electrode Setpoint
25
25
25





Temperature Lid Setpoint 90
90
90





 Temperature Liner Setpoint
 70  70  70          
Temperature Spool Setpoint 120
120
120





Execute if later Step Restarted
#False
#False #False




External Detector Endpoint Recipe Name
#None
#None #None




No Endpoint found alarm severity
#Error
#Error  #Error




 Camera Mode Setpoint
#None  #None  #None          
 Bias RF Power Error Timeout
10000
 10000  10000      
 
 IPC RF Reflected Power Error Timeout
 10000  10000  10000          

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