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STS II Response Table

This response table can be used as a recipe optiminzation chart for labmembers wanting to change the parameters of standard recipes.

HRM Response Table

 

Trends for Controlling process results

Etch rate

Profile
(
­ negative) (¯ positive)

Selectivity

Grass

Breakdown

Sidewall Roughness

Etch gas increase

­­­

­­­

­

¯

­

­

Dep gas increase

¯«

«

­

­

¯«

¯

Etch:Dep time ratio increase

­

­

­­«

¯

­­«

­

Pressure increase

­­­

­

­

¯«

­

­

Dep Coil Power increase

¯«

¯«

­­«

­

¯«

¯

Etch Coil Power increase

­

­

­

¯

­

­

Platen Power increase

­­«

­­«

¯

¯

«

«

EM1 value (e) increase

¯«

¯«

­

­­«

¯«

«

EM1 delay (e) increase

­­«

­­«

¯

¯«

­­«

«

 

E=etch

« no effect or negligible effect

­ increase

¯ decrease

 

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