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Rules for Operating svgdev

SVG Dev Users: Please READ!

Do not change the following standard programs for track 1 (back) and 2 (front):

Develop Program 2 - Shipley MF-26A developer for I-line resist SPR 955 CM-.7, 0.7 µm and 1.0µm
event #5 has rinse

or

Develop Program 5 - Shipley MF-26A developer for I-line resist SPR 955 CM-.7, 0.7 µm and 1.0µm
event #5 is spry1

 

Develop Program 3 - Shipley MF-26A developer for 1 µm SPR3612 resist for 1 minutes

Develop Program 4 - Shipley MF-26A developer for 1.6µm SPR3612 resist for 2 minutes

 

Develop Program 6 - Shipley MF-26A developer for 7µm SPR220-7 resist

Develop Program 7 - Shipley MF-26A developer for 3 - 4 µm SPR220-3 resist


Develop Program 1 and 8 - no standard program


Develop Program 9 - End 0 (this program skips the develop step, bake only)

 

Postbake Program 1 - Postbake for SPR3612 1.0µm at 110°C for 60 seconds

Postbake Program 2 - Postbake for SPR3612 1.65µm at 110°C for 120 seconds

Postbake Program 3 - Postbake for SPR 955 CM-.07 at 110°C for 90 seconds

 

Never change any of these Programs or Bake Temperatures

For SPR220-3 or SPR220-7 resists is no bake after development required!

Failure to follow these rules will result in removal from user list and mandatory re-training.

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