Rules for Operating svgdev
SVG Dev Users: Please READ!
Do not change the following standard programs for track 1 (back) and 2 (front):
Develop Program 2 - Shipley MF-26A developer for I-line resist SPR 955 CM-.7, 0.7 µm and 1.0µm
event #5 has rinse
Develop Program 5 - Shipley MF-26A developer for I-line resist SPR 955 CM-.7, 0.7 µm and 1.0µm
event #5 is spry1
Develop Program 3 - Shipley MF-26A developer for 1 µm SPR3612 resist for 1 minutes
Develop Program 4 - Shipley MF-26A developer for 1.6µm SPR3612 resist for 2 minutes
Develop Program 6 - Shipley MF-26A developer for 7µm SPR220-7 resist
Develop Program 1 and 8 - no standard program
Develop Program 9 - End 0 (this program skips the develop step, bake only)
Postbake Program 1 - Postbake for SPR3612 1.0µm at 110°C for 60 seconds
Postbake Program 2 - Postbake for SPR3612 1.65µm at 110°C for 120 secondsPostbake Program 3 - Postbake for SPR 955 CM-.07 at 110°C for 90 seconds
Never change any of these Programs or Bake Temperatures
For SPR220-3 or SPR220-7 resists is no bake after development required!Failure to follow these rules will result in removal from user list and mandatory re-training.