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Exposure Tool Summary

 Coral Name
 Type  Mask Size
 Wafer Size
Max Exposure Area
Obj. Seperation
Min Resolution
Comment
asml  5:1 reducing stepper
 5"  4" Only
     0.45um  
evalign  Contact 1:1 aligner
 5" and 7"
 pieces to 6"
 4" and 6" diameter  42-100 mm  1.5um  Anodic Bond,backside align
including IR
karlsuss
 Contact 1:1 aligner  4", 5"and 7"
 pieces to 6"
  5" mask = 4"
  7" mask=6"
  4" mask = 3"
 50-100mm  1.5um  Backside align,
including DUV and IR
karlsuss2
 Contact 1:1 aligner  4", 5"and 7"
 pieces to 6"
  5" mask = 4"

  7"mask=6"

  4" mask = 3"
 50-100mm  1.5um  Backside align

 

Note: The process monitoring of some exposure tools can be found here:

https://snf.stanford.edu/SNF/processes/process-modules/photolithography/photolithography-qualifications-1

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