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SVG Coat Tracks, svgcoat/svgcoat2 new

The SVG (Silicon Valley Group) coater is an automated track system for dispensing photoresist on 4" silicon, glass, or quartz wafers. The system includes two stations: a prime oven which bakes the wafer and dispenses the adhesion promoter, HMDS; and a combination spinner, which dispenses photoresist, and pre-bake oven which cures the resist. HMDS is only available at track 2. The uniformity of spun photoresists are typically +/- 100 Å.

Picture and Location

 SVG Coat Tracks

This tool is located at D3 on the Lab Map.

 

Process Capabilities

Cleanliness Standard

The svgcoat appears in "All" three equipment groups (clean, semiclean, and gold).


Features

  • Two automated, single-wafer track systems.
  • Dispenses three different positive photo resists and one Image Reversal resist
  • Selectable programs at the spinner and each of the bake ovens.
  •  "Manual" dispense program allows the user to dispense other approved photoresists, on track 1 only


Contact List and How to Become a User

Contact List

  • Process Staff: Uli/Mahnaz
  • Maintenance:  Mario/Gary
  • Super-Users:  none

 

Training to Become a User

  1. "All Litho" is required before training on any of the lithography tools. Contact the trainers for the class schedule and training materials (which must be reviewed before the class).
  2. Read all material on the SNF website concerning this tool, including Background, Process Capabilities, Operating Procedures and Process Monitoring.
  3.  View the SVG coater training movie, you will find the link on the training video page.
  4. Print the SNF Shadowing Form and the SVG checklist on clean room paper and contact a qualified user of the wet bench to arrange to ‘shadow’ them while they use the tool. You are responsible to be with that labmember for the full time they are operating the tool, and it would be intelligent to ask questions and try to become as familiar as possible with the wet bench during this ‘shadowing.’  You may have to shadow the qualified user more than one time. The qualified user and you will have to sign the SNF Shadowing Form.
  5.  Contact SNF training contact on the Equipment Summary page.
  6. For training please see the Training Calendar for scheduled trainings.

 

Operating Procedures

Track Overview


Track 1

  • Resist Coat
    • Shipley 3612 for std 1 µm or 1.6 µm positive resist
    • SPR220-7 for std 7 µm, or 10 µm positive resist or thicker films
    • SPR220-3 for std 3 µm or 4 µm positive resist
    • Ebeam Resist - manual application, only PMMA 2%, PMMA 5%, UVN30


Track 2

  • HMDS vapor prime
  • Resist Coat
    • Shipley 3612 for std 1 µm or 1.6 µm positive resist
    • SPR 955 CM-.7 I Line resist  for std 0.7 µm,  0.9 µm to 1 µm positive resist
    • AZ5214IR for 1.26 µm, 1.4µm, 1.6µm, and 2.0 µm Image Reversal resist

 

Special Notes or Restrictions

  • 4 inch round wafers only, like silicon, glass, or quartz, no pieces
  • ASML users: use only track 2 (back track)
  • NO manual resist dispense on track 2
  • Manual resist spinning is possible at track 1 only, but extra training from staff is required.
  • NO temperature change of the bake stations
  • NO polyimides, NO LOL2000, NO PMMA 950K 9%, NO ZEP, NO SU8 (use the headway coater)
  • Don't run wafers with etched holes , vacuum holds the wafer on the chuck and resist would damage the system.
  • Please check the reservation page, users are not allowed to make reservations but staff reserves the tool for training and classes 
  • Check the MSDS sheets for hazard information on the photoresist you are using and handle them with caution.
  • Close the plastic doors to prevent fumes from getting in the lab and notify the staff immediately if resist smells are detected while working at the station.


Basic Operation Instructions

Initial Checks

  1. Check reservation page, staff reserves the tool for training classes.
  2. Enable "svgcoat" for front track or "svgcoat2" for back track.

 

Before Coating

  1. Check the photoresist waste container under tracks
        • If waste container is half full, press Track 1 or Track 2 (Chemical Delivery Unit, upper right corner) to pump the waste into the large waste container (system drain) inside of the flammable cabinet.
        • If waste container alarm goes on, the track will shut down. Silence alarm, empty waste container, switch alarm back on, continue working.
        • If large waste container (system drain) alarm goes on: Silence alarm, shut system down on Badger and contact maintenance.
    1. Check the temperature of the hotplates
        • Track 2 only: Prime set at 125°C (DO NOT change the temperature)
        • Bake set at 90°C (DO NOT change the temperature)
    2. Select programs
        • Use the "recipe manager" program. Instructions are next to the tool.
        • Check "Rules for Operating svgcoat/svgcoat2"  page next to the tool for complete list of prime, coat, and bake programs.
      1. Check that all stations are in Auto Mode. The LED next to the word Auto should be on.

       

      Coat Process

      1. How to load wafers using metal cassette on the load station (on the left side of the tool):
          • No resist on back side of wafers! Resist damages the hot plates.
          • Load the wafers starting from the bottom (H-bar) of the cassette, front side facing up!
          • Place the loaded cassette on the loading deck with the H bar down so that the H-bar fits into the slot.
          • The white plastic stopper at the cassette has to face the outside of the system.
          • It is recommended to run three or more dummy wafers prior to your process wafers. There are dummy wafers in a box next to the SVG coater. The dummy wafers might have some resist on the front side. If you re-use a dummy wafer, make sure the back side has NO resist!

      2. Place an empty metal cassette onto the unload station (on the right side of the tool) with the H-bar down so that the H-bar fits into the slot, and the white plastic stopper has to face the outside of the system.
          • If a cassette is already present, tilt it for reset, otherwise the machine does not know there is a new cassette and will not transfer wafers from the cool plate to the cassette.
      3. Press "START"
        • Don't leave the system while your wafers are running.

       

      Clean Up

      1. Once all wafers are in the receiving cassette, press "Reset Receiver Station" in the ‘recipe manager’ program, the cassette will move up.
      2. Remove the cassette from the station, place the dummy wafers back into the dummy wafer box and your wafers in your transportation box.
      3. Disable "svgcoat" or "svgcoat2".

       

      Problems: Alarm Sounds on Track

      Fix by pressing "CLEAR" in the "recipe manager" program, then locate the problem and correct it:

      1. Look for belts turning: If belts are turning, someone has removed a wafer before completion of process. Take a dummy wafer and place it on the turning belts, remove and resume your run.
      2. Spinner chuck does not turn: Look for red lights on the controller, push them to clear red light


      Problems: Utility Alarm panel upper left corner

      If alarm sounds, switch Audible Alarm "OFF", locate problem and correct it, then switch Audible Alarm back to "ON".

        • track 1 resist 1: Shipley 227-7 bottle is empty, report problem and contact maintenance.
        • track 1 resist 2: Shipley 3612 bottle is empty, report problem and contact maintenance.
        • track 1 resist 3: Shipley220-3 bottle is empty, report problem and contact maintenance.
        • track 2 resist 1: Shipley 3612 bottle is empty, report problem and contact maintenance.
        • track 2 resist 2: negative resist AZ5214IR bottle is empty, report problem and contact maintenance.
        • track 2 resist 3: Shipley955 bottle is empty, report problem and contact maintenance.
        • System Drain: main resist waste container is full, shutdown system and contact maintenance
        • Track 1 Drain: track 1 resist waste container is full, press Track 1 on Chemical Delivery Unit, upper right corner
        • Track 2 Drain: track 2 resist waste container is full, press Track 2 on Chemical Delivery Unit, upper right corner
        • Track 1 EBR: EBR at track 1 is empty, shutdown track 1 and contact maintenance
        • Track 2 EBR: EBR at track 2is empty, shutdown track 2 and contact maintenance
        • Track 2 HMDS: HMDS at track 2 is empty, shutdown track 2 and contact maintenance

       

      Process Monitoring and Machine Qualification

      Qual Process Overview

      There are 2 places to find process monitoring of the svgcoat tracks: Litho Qualification runs done by staff and thickness results saved in Badger.

       

      Qualification Results

      The results of Litho Qualification runs can be found in spreadsheets here:
      https://snf.stanford.edu/SNF/processes/process-modules/photolithography/photolithography-qualifications-1

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