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Wet Benches Summary Page

"Wet Benches" are stations for wet etching and cleaning of wafers and devices. ("Litho Benches" in contrast, are used for resist processing.) The various wet benches differ in the specific process modules available and the materials allowed at each station.
Equipment Name Materials/
Equip Group
Use
 Chemicals allowed
Wafer Size
Comments
Wbclean-1 and 2 Wetbench (former wbdiff)
 Clean Pre-Diffusion Clean and
Oxide etching
5:1:1 H2O:H2O2:NH4OH
5:1:1 H2O:H2O2:HCl
50:1 HF
6:1 BOE
3 to 6 inch
 NO resist
 Non-Metal Wetbench  Clean Stripping photoresist and
Oxide etching
9:1 H2SO4:H2O2
50:1 HF, 6:1 and 20:1 BOE
3 to 6 inch  Resist allowed
 Nitride and Tweezer Cleaning Wetbench  Clean Silicon-Nitride etch and
Delrin tweezers cleaning
 85% Phosphoric acid
3 to 6 inch  HF vapor etch
 General Wetbench 2  Clean (Ge) Germanium wafer clean
PRS1000
Hf
4 to 6 inch  
Wbclean-3 and wbdecon (former wbsilicide)
Clean wbclean-3
Pre-Diffusion Clean and
Oxide etching
wbdecon: KOH decontamination
5:1:1 H2O:H2O2:NH4OH
5:1:1 H2O:H2O2:HCl
50:1 HF
6:1 BOE
4 to 6 inch
 Metal Wetbench  Semiclean Aluminum etch
Stripping resist from metal wafers
Cleaning of metal wafers before anneal
Aluminum Etchant
PRS-3000
PRS-1000
50:1 HF
6:1 BOE or 20:1 BOE
Peroxide-based metal etchant
4 to 6 inch  
 Wbflexcorr-3 and 4 (former wbgen)
 All
Manual wet etching of non-standard materials,
GaAs not allowed
 Acids or bases Pieces to 6 inch Labware for "clean" KOH or TMAH etching available
 Wbflexcorr-1 and 2 (former wbgaas)
 All
Manual wet etching of non-standard materials, GaAs allowed
 Acids or bases
Pieces to 6 inch GaAs allowed in personal labware only
 Miscellaneous Photoresist Wetbench  All
Manual developing of resist
 Acid or base developers
Pieces to 6 inch Headway, manual resist spinner
 Lithography Solvent Bench  All Manual solvent cleaning of substrates or masks
 Solvents
Pieces to 6 inch Teflon coated metal tweezers cleaning
 Ebeam Process Wetbench  All Manual developing of Ebeam resist
 Solvents
Pieces to 4 inch  
 Mask Scrubber  N/A Mask cleaning
 Water
no wafers
 4 to 5 inch masks
 Solvent Wetbench  All
Manual solvent cleaning of substrates or equipment parts
 Solvents
Pieces to 6 inch  
Critical Point Dryer  Cont CO2 drying after release of micromachined devices
CO2
IPA
Pieces to 6 inch

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