Miscellaneous Photoresist Wet Bench
The wbmiscres wet bench is primarily used for manual spinning and developing of photoresist. No solvents may be used here. The bench is equipped with a rinse sink with a gooseneck, an automatic dump rinser, two N2 guns, DI hand sprayer, and hot plate. There are two spin/rinse dryers located to the left of the bench for 4 or 6 inch wafers. The headway manual spinner is mounted on the right side of the bench top.