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Wet Bench Clean_res-piranha and -hf (former Nonmetal)

Wet Bench Clean_res-piranha and -hf, (former wbnonmetal)

This bench (semi-automated) is part of the Clean Equipment Group for 3", 4", and 6" Si, SiGe, and quartz substrates and is primarily used for stripping photoresist, removing scribe dust and wet oxide etching. Wafers may not contain or have ever contained any metals, nor been exposed to equipment which may pose this contamination risk. This station contains two hot pots, each contains 90% sulfuric acid/hydrogen peroxide ("piranha") for stripping resist ,two Teflon tanks containing 50:1 HF, 20:1 BOE, or 6:1 BOE for etching oxide, three automatic dump rinsers and two spin/rinse dryers.

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