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Equipment
Up to date Equipment Summary
Equipment Summary
Beam Tools
Hummer V Sputter Coater: hummer
Raith 150 Ebeam Writer: RAITH
Optical Photolithography Overview
Resist Coat, Tool Summary
Headway
Laurell
SVG Coat Tracks 1&2
EVG 101 Spray coater
Exposure Tool Summary
ASML
KarlSuss Aligner
EV Group Contact Aligner
Develop Summary
SVG Developer
Oven Bake & Cure Summary
YES Oven
Oven 110C
Oven 90C
Singe Oven 150C
Chemical Vapor Deposition
Low Pressure CVD
Teos2
ThermcoNitride
ThermcoLTO
TylanNitride
TylanBPSG
LPCVD tests
Thermcopoly
Thermcopoly2
CVD-graphene
CVD-nanotube
PECVD
PlasmaTherm Versaline HDPCVD
PlasmaTherm CCP-Dep
STS PECVD Tool
ALD
Savannah
Fiji1
Fiji2
Fiji3
MVD
Available Films at SNF
EE412 Final Reports
ALD Tutorials
ALD Images
Savannah semi-clean contamination category policy
Epi2 (Chamber A)
Epi papers/images
Sidewall epitaxial piezoresistor process and characterisation for in-plane force sensing applications
Room temperature 1.6 μm electroluminescence from Ge light emitting diode on Si substrate
Effects of hydrogen annealing on heteroepitaxial-Ge layers on Si: Surface roughness and electrical quality
Ge on Si by Novel Heteroepitaxy for High Efficiency Near Infrared Photodetection
Fabrication of High-Quality p-MOSFET in Ge Grown Heteroepitaxially on Si
High-efficiency metal–semiconductor–metal photodetectors on heteroepitaxially grown Ge on Si
Defect Reduction of Ge on Si by Selective Epitaxy and Hydrogen Annealing
Low-Temperature, LPCVD and Solid Phase Crystallization of Silicon–Germanium Films
Effect of Isochronal Hydrogen Annealing on Surface Roughness and Threading Dislocation Density of Epitaxial Ge on Si
Germanium In Situ Doped Epitaxial Growth on Si for High-Performance n+/p Junction Diode
Germanium In Situ Doped Epitaxial Growth on Si for High-Performance n+/p-Junction Diode
High-Efficiency p-i-n Photodetectors on Selective-Area-Grown Ge for Monolithic Integration
High Performance n-MOSFETs with Novel Source/Drain on Selectively Grown Ge on Si for Monolithic Integration
Effect of isochronal hydrogen annealing on surface roughness and threading dislocation density of epitaxial Ge films grown on Si
Low Temperature Germanium Growth on Silicon Oxide Using Boron Seed Layer and In Situ Dopant Activation
Epi2B (Chamber B)
MOCVD
aix200
aix-ccs
SNF MOCVD lab capability introduction
Metalization & Sputtering
Evaporation
IntlVac Nanochrome I Evaporator, intlvac_evap, Automatic
Innotec ES26C E-Beam Evaporator
AJA-evaporator
Sputtering
Metalica Sputter System
Sputtering Papers
Intlvac NanoChrome 1 Sputter
Lesker-Sputter
Dry Etching
Table and Overview of available etchers at SNF
General Information on Plasma Etching
Overview of Etchers Available at SNF
How to Attach Samples to Carrier Wafers for Plasma Etching or Deposition
Etch Equipment Trobleshooting Guide
AMT 8100 Plasma Etcher, amtetcher (semi-clean)
AMT page, new wiki site
AMT 8100 Plasma Etcher, amtetcher
Amtetcher Quick Start
Standard Recipes and Etch Rates
NEW! Recent qualification Results
Non-Standard and Lesser Used Recipes
200 nm Structures using Amtetcher
Fine Example of RF arcing
Drytek2 Model 100, drytek2 (semiclean)
Drytek 2 page, new wiki site
Drytek2 Model 100, drytek2
Drytek2 Quick Start Instructions
Standard Recipes and Etch Rates for Drytek2
Recent Process Qualifications
Procedure for Balancing RF Power to Electrodes
Drytek4 Model 100 (modified), drytek4 (contaminated)
Drytek4 Model 100 (modified), drytek4
Etch Rates and Selectivities
Gasonics Aura Plasma Asher, gasonics (semi-clean)
Gasonics Plasma Asher
Lam Research 9400 TCP Poly Etcher, lampoly (clean)
lampoly page, new site
Lampoly Operating Procedure
Clarycon Website
Etch Profiles
Isotropic silicon etching
Semiclean Wafers on lampoly/p5000etch Poly
Anistropic Etching of Single-Crystal Silicon
Images
Matrix Plasma Asher, matrix (contaminated)
Matrix, new site
Matrix Plasma Asher, matrix
MRC Model 55 RIE, mrc (contaminated)
MRC, new site
MRC Model 55 RIE, mrc
Quick Start for MRC
Selected Recipes
Qual results
Using the Pirani Gauge on the MRC
Applied Materials Precision 5000 Etcher, p5000etch (semi-clean)
P5000, new wiki page
Applied Materials Precision 5000 Etcher, p5000etch
Quick Start for P5000etch
NEW! Recent Process Qualifications
Endpoint Wavelengths
Plasma Quest ECR Etcher, pquest (contaminated)
Plasma Quest ECR Etcher, pquest
PQuest Chemistry Calendar
STS Deep RIE Etcher, stsetch (semi-clean)
stsetch, new wiki page
STS Deep RIE Etcher, stsetch
Quick Start for Stsetch
SEM Images of Selected Process Qualification Wafers
Description of Wafer Holder
Characterization of a Time Multiplexed Inductively Coupled Plasma Etcher
Effect of wafer holder on etch profiles & grass
STS Deep RIE Etcher- Studies
STS HRM Deep RIE Etcher, stsetch2 (semi-clean)
STS HRM Deep RIE Etcher, stsetch2
STS II Response Table
Throttle vs Pressure for SF6 and C4F8
STSetch2 etch profile
How to Improve Etch Profiles Using stsetch2
Characterization
Crystalbond Procedure
Xactix
Xactix: A XeF2 dry, chemical etcher
Oxford III-V Etcher
ox-35, new wiki page
Operating Instructions- Ox-35
Characterization
Plasmatherm Etchers (pt-dse, pt-ox and pt-mtl)
Plasma Therm Etchers - General Operating Procedure
PlasmaTherm Metal Etcher (pt-mtl)
PlasmaTherm Oxide Etcher (pt-ox)
PlasmaTherm Deep Silicon Etcher (pt-dse)
PlasmaTherm - Creating/ Editing Recipes
Processing Transparent Substrates in the VersaLine Systems
6" Conversion Protocol
Images
Endpoint
SPTS uetch vapor etch system, uetch
SPTS uetch vapor etch system
Oxford-rie
oxford-rie, new wiki link
Operating Instructions- Ox-RIE
SiO2 Etch Characterization
Annealing, Oxidation & Doping
Furnaces, oxidation and annealing (clean, semi-clean and contaminated)
Thermco Oxidation and Annealing Furnaces, Thermco1 - 4
Furnaces, Forming Gas Anneal (FGA), tylanfga and fga2
Oxide Thickness Calculators
Rapid Thermal Annealing
All-Win 610 Rapid Thermal Process Systems
Doping
POCl3 and BBr3 Predep Furnaces- tylan5 and tylan6
Wet Benches Summary
Wet Bench Clean
Wet Bench Clean-1 and -2
Wet Bench Clean_res-piranha and -hf (former Nonmetal)
Wet Bench Clean_res-piranha and -hf
Wet Bench Decon and Clean-3
wbdecon and wbclean-3
Wet Bench Metal
Wet Bench Metal, wbmetal
Wet Bench Nitride
Wet Bench Nitride, wbnitride
Wet Bench Flexcorr-3 and -4
Wet Bench Flexcorr-3 and -4, wbflexcorr-3 and -4
Wet Bench wbflexcorr-1 and wbflexcorr-2
Wet Bench wbflexcorr-1 and -2
Wet Bench Germanium
Wet Bench Germanium, wbgen2
Wet Bench Solvent
Wet Bench Solvent, wbflexsolv-1 and -2
Lithography Solvent Bench, lithosolv
Miscellaneous Photoresist Wet Bench
Miscellaneous Photoresist Wet Bench, wbmiscres
CPD
CPD Critical Point Dryer Tousimis 915B, cpd
Additional Process Info
Wet Bench Operating Instructions, WAFAB
Wafer Bonding, Sawing & Polishing
GnP POLI-400L: cmp
CMP
EV Group Wafer Bonder: evbond
Electronic Vision 501 Bonder, evbond
Benchtop Muffle Furnace: thermolyne
K&S 775 Wafer Dicing Saw: wafersaw
K&S Dicing Blades
wafersaw Operation
DISCO Wafer Saw
DISCO Wafersaw Operating Procedure
Images
Lasercutter
Lasercutter
Micromill
Characterization & Testing Summary
Cornell's Test Equipment Tutorial
AFM2
AFM2, afm2
Alphastep 500
Alphastep 500
Flexus 2320
Flexus 2320 Stress Gage, stresstest
Nanospec
Nanospec 010-180, nanospec
Nanospec 210XP, nanospec2
Prometrix
Prometrix OmniMap RS35c, prometrix
Tencor P2
Tencor P2, p2
Woollam M2000
Woollam M2000 Company Website
SNF Woollam M2000 Spectroscopic Ellipsometer Instructions
SNF Woollam Wafer Mapping Instructions (VASE MANAGER)
Microscope
Sensofar S-neox
Sensofar S-neox
Micromanipulator6000
micromanipulator6000
Lab Maps
Equipment Locations (PDF)
Emergency Map (gif)
Emergency Map (PDF)
ExFab (previously known as nSiL)
PDS 2010 LABCOTER™ 2 Parylene Deposition System
Parylene Coater Run Sheet
PDS2010 Labcoter 2 Parylene Deposition System
Parylene Properties Reference
PDS 2010 LABCOATER 2 Parylene Deposition System
Parylene Coater Run Sheet
Glovebox
nSiL Glovebox- Training and Operating Manual
Solidscape 3d Wax Printer
Solidscape 3d Wax Printer
Heidelberg MLA 150
User Manual
Quick guide - Heidelberg MLA 150
Design Guide
Design Conversion Guide
Quick User Guide - Heidelberg MLA 150
User Manual
Design Conversion Guide
Design Guide
Finetech Lambda Flipchip bonder
Finetech Fineplacer Lambda Operating Instructions
Lab Member Project Reports
Lesker - Sputter
Lesker - Sputter
AJA Evaporator
AJA Evaporator
Raith Ebeam Lithography tool
Link to Raith Ebeam Lithography tool
DISCO Wafer Saw
Link to DISCO wafer saw
Wbexfab_solv, Wbexfab_solv-plug
Wbexfab_solv, Wbexfab_solv-plug
Wbflex_solv images
Wbexfab_solv hot plate controller programming
Wbexfab_solv and wbexfab_solv-plug
Headway 3
Headway 3
Headway 3 images
Headway 3 Manual
YES Oven 2
Malvern Zetasizer DLS
Thinky Mixer
Cytoviva
Jasco UV-Vis-NIR
Ultron Tape Mounter
Ultron Tape Mounter
Optomec
Optomec Manual
Optomec Manual
Nanoscribe Photonics Professional GT
Nanoscribe Photonics Professional GT Manual
Nanoscribe Photonics Professional GT Manual
Micromist Coater
Micromist coater user manual
Micromist coater user manual
Alveole Primo
Alveole Primo Protein Patterning Protocol
Alveole Primo Protein Patterning Protocol
Asylum AFM with environmental control chamber
Sinton Lifetime Tester
DISCO Backgrinder
Monthly Tool Monitoring
Process
SNF Process, links
Process Modules
Process Modules
Photolithography
Standard Resists at SNF
EBeam Resists at SNF
Lift Off Procedures
SU-8 Procedures
Polyimide Procedures
Photoresist Exposure KS and EVG aligners Time Table
Resist Modules
Photolithography Qualifications
Common photolithography problems at SNF
Maskmaking
Etching
Wet Etching
Dry Etching
Oxidation Furnaces- grown oxides
Oxide Thickness Calculators
Cleaning and Stripping of Substrates, Labware and Tweezers
Diffusion Cleaning at SNF
Photoresist Stripping
Tweezers Cleaning
EE410 Device
Ebeam Resists
Ma-N 2403
E-Spacer 300Z
2% 950K PMMA
Runsheets
Runsheets, google docs link
Basic Processing at SNF Runsheet
Runsheets for Etch Qualification Test Wafers
Guide to Wafer Production for Etch Tool and Process Qualification Wafers
Runsheet for 100nm Thermal Oxidation Test Wafers
Runsheet for 1um LTO Test Wafers
EE410 Runsheet 2007-8
EE410 CMOS Runsheet Winter 2015
EE410 LOCOS Run Sheet -March 2017
EE312 - Runsheet
Process Resources
TOx Thickness Calculator
Tylan Monitoring
Gage Readings
Other Resources
Shadow Masks
Community Service Projects
About Community Service
Polysilicon characterization
Low Stress PolySi -Exptl Plan
Low Stress PolySi Characterization Report
EE410 Redesign
EE410 Redesign Summary
Cleanliness & Contamination
TXRF analysis of gold-contaminated wafers
PEB Characterization
drytek4 Characterization
STSetch2 Characterizations
SOI etch-Khuri-Yakub Group
High Aspect Ratio/Narrow Trenches
ALD HfO2 characterization for RRAM
ALD Oxide Characterization Proposal
MVD- Polyimide Development
MVD Polyimide Community Service Proposal
EE412 Fall 2014 Report
MVD Polyimide EE412 proposal
Carbon Nanotube Furnace- Recipe development and characterization
CNT Furnace Recipe Development Proposal
MOCVD process development and sample characterization
PL mapping of III-nitrides
AlGaN/GaN HEMT structure on Si.pdf
Fab Project Courses: E241 & EE412
EE412 and E241 Projects: List and links to reports and presentations
PDMS processing at SNF
PDMS Processing at the SNF
MOCVD Workshop
MOCVD_Workshop_Presentation_Prof. Debbie Senesky
MOCVD Workshop Presentation-Nanometrics
MOCVD Workshop Presentation-Lehighton
MOCVD Workshop Presentation-Dr. Xiaoqing Xu
EE410 and EE312
EE410 and EE312 Comprehensive summary
SNF410 NMOS process flow without isolation
SNF410 Depletion NMOS Report
Materials/Chemicals
Contamination Groups at SNF
Contamination Groups for Controlling Process Flow Materials
MSDS-Standard Chemicals
SDS, link to snf-web
SDS gases, files only
15% Arsine 85% Nitrogen
Argon
Boron Trichloride
Boron Trifluoride
Carbon Dioxide (Matheson)
Carbon Dioxide (Praxair)
Chlorine
Chlorine
Disilane
Dichlorosilane
Halocarbon 14
Halocarbon 23
Halocarbon 22
Halocarbon 116
Helium
Hydrogen Bromide
Methane
Nitrogen Trifluoride
Nitrogen
Nitrous Oxide (Air Products)
Nitrous Oxide (Praxair)
Boron Tribromide (BBr3)
Silane (Air Products)
Silane (Praxair)
Silicon Tetrachloride
Sulfur Hexafluoride (Praxair)
Phosphorous Oxychloride (POCl)
Sulfur Hexafluoride (Air Products)
Ammonia
Ultrasol 2EX MSDS
Ultrasol S10 MSDS
A-174 Silane
MICRO-90 CONCENTRATED CLEANING SOLUTION
Parylene Dimer DPX-C
SDS (MSDS) and information: Gases
Nitrogen Trifluoride (NF3)
Chlorine(Cl2)
Hydrogen Bromide (HBr)
100ppm Arsine in Hydrogen (100 ppm AsH3/H2)
Germane(GeH4)
1% Phosphine/Hydrogen (1%PH3/H2)
Hydrogen Chloride (HCl)
15% Phosphine in Silane (15% PH3/SiH4)
100ppm diborane in hydrogen (100ppm B2H6/H2)
1% diborane in hydrogen (1% B2H6/H2)
Nitrous Oxide (N2O)
Ammonia (NH3)
Dichlorosilane(SiH2Cl2)
5% Diborane in Hydrogen (5% B2H6/H2)
10% Phosphine in hydrogen (10% PH3/H2)
80% Methane in Argon (80% CH4/Ar)
2% Boron Trichloride in Argon (2% BCl3/Ar)
2% Silane in Nitrogen (2%SiH4/H2)
Silane (SiH4)
Methane (CH4)
Disilane (Si2H6)
4% Hydrogen in Nitrogen (4% H2/N2)
Nitrogen (N2)
15% Arsine in Nitrogen (15% AsH3/N2)
Argon
Boron Trichloride (BCl3)
Boron Trifluoride (BF3)
Carbon Dioxide (CO2)
Chlorine (Cl2)
Halocarbon 14
Halocarbon 23
Halocarbon 22
Halocarbon 116
Helium (He)
Silicon Tetrachloride (SiCl4)
Sulfur Hexafluoride (SF6)
MSDS ALD Precursors
TrimethylAluminum
Tetrakis(dimethylamido)titanium(IV) (TDMA-Ti) MSDS
Bis(ter-butylimino)bis(dimethylamino)tungsten(VI) MSDS
Tetrakis(dimethylamido)hafnium(IV) MSDS
Tungsten Hexacarbonyl W(CO)6
Tetrakis(dimethylamido)zirconium(IV) (TDMA-Zr) MSDS
Tetrakis(ethylmethylamido)zirconium(IV) (TEMA-Zr) MSDS
Tris(diethylamido)(tert-butylimido)tantalum(V)
Tris[dimethylamino]Silane (3DMAS) MSDS
(3-Aminopropyl)triethoxysilane (APTES) MSDS
Tris(tert-botoxy)silanol MSDS
Trimethyl(methylcyclopentadienyl)platinum(IV) MSDS
Bis(cyclopentadienyl)nickel (nickelocene) MSDS
Bis(ethylcyclopentadienyl)ruthenium(II) MSDS
Diethylzinc (DEZ) MSDS
Tris[N,N-bis(trimethylsilyl)amide]yttrium MSDS
Cyclopentadienyl-indium MSDS
Tetrakis(dimethylamino)tin(IV) TDMA-Sn MSDS
Tris(cyclopentadienyl)yttrium (3CpY) MSDS
Tetramethyl-Tin
Trimethylgallium
Bis(1,2,4-triteriarybutylcyclopentadienyl)-strontium
Bis(ethylcyclopentadienyl)nickel(II) MSDS
Ferrocene
Titanium (IV) Isopropoxide (TTIP) MSDS
Bis(n-propyltetramethycyclopentadienyl)barium MSDS
Bis(pentamethylcyclopentadienyl)barium, 1,2-dimethoxyethane adduct MSDS
Bis(cyclopentadienyl)cobalt (II) MSDS
Fe amidinate MSDS (Accudep Iron)
Pentakis(dimethylamino)tantalum(V)
MSDS Nickel bis(N,N'- ditertialbutylacetamidinate) AKA Dow Accudep-Ni
MSDS- Molybdenum hexacarbonyl
Process or Materials Review Requests (PROM) and Form
PROM Archive
PROM form Template
Safety/Policies
Stanford EH&S
Stanford EH&S Chemical Safety Database
Stanford University - Utilities Services
Stanford University - Utilities Services
Training
Training Calendar
About Equipment Training
Training Videos
Nano at Stanford Training and Educational Materials
nano@stanford Training and Educational Materials
Nano jpgs
“Nano @ Stanford - SNF” online training and education course
SNF Shadowing Form
Links
Stanford Nano Shared Facilities (SNSF)
XReporter
Personal tools
Log in
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Chlorine(Cl2)
Navigation
Materials/Chemicals
Contamination Groups at SNF
MSDS-Standard Chemicals
SDS, link to snf-web
SDS gases, files only
SDS (MSDS) and information: Gases
Nitrogen Trifluoride (NF3)
Chlorine(Cl2)
Cl2-Praxair
Cl2-Matheson
Cl2-Scott
Hydrogen Bromide (HBr)
100ppm Arsine in Hydrogen (100 ppm AsH3/H2)
Germane(GeH4)
1% Phosphine/Hydrogen (1%PH3/H2)
Hydrogen Chloride (HCl)
15% Phosphine in Silane (15% PH3/SiH4)
100ppm diborane in hydrogen (100ppm B2H6/H2)
1% diborane in hydrogen (1% B2H6/H2)
Nitrous Oxide (N2O)
Ammonia (NH3)
Dichlorosilane(SiH2Cl2)
5% Diborane in Hydrogen (5% B2H6/H2)
10% Phosphine in hydrogen (10% PH3/H2)
80% Methane in Argon (80% CH4/Ar)
2% Boron Trichloride in Argon (2% BCl3/Ar)
2% Silane in Nitrogen (2%SiH4/H2)
Silane (SiH4)
Methane (CH4)
Disilane (Si2H6)
4% Hydrogen in Nitrogen (4% H2/N2)
Nitrogen (N2)
15% Arsine in Nitrogen (15% AsH3/N2)
Argon
Boron Trichloride (BCl3)
Boron Trifluoride (BF3)
Carbon Dioxide (CO2)
Chlorine (Cl2)
Halocarbon 14
Halocarbon 23
Halocarbon 22
Halocarbon 116
Helium (He)
Silicon Tetrachloride (SiCl4)
Sulfur Hexafluoride (SF6)
MSDS ALD Precursors
Process or Materials Review Requests (PROM) and Form
Info
Chlorine(Cl2)
Cl2-Praxair
Cl2-Matheson
Cl2-Scott
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