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MSDS ALD Precursors

Material Safety Data Sheets for all Precursors used in the SNF to date. This does not necessarily mean these precursors are currently in stock or provided by the SNF.
File TrimethylAluminum
Trimethylaluminum is an organo-metalic precursor used for ALD of aluminum oxide and aluminum nitride films.
File Tetrakis(dimethylamido)titanium(IV) (TDMA-Ti) MSDS
Tetrakis(dimethylamido)titanium(IV) or TDMA-Ti is a precursor used for ALD of titanium oxide and titanium nitride and elemental titanium films.
File Bis(ter-butylimino)bis(dimethylamino)tungsten(VI) MSDS
Material safety data sheet for Bis(ter-butylimino)bis(dimethylamino)tungsten(VI), an ALD precursor used for deposition of tungsten oxide, tungsten nitride, and elemental tungsten films.
File Tetrakis(dimethylamido)hafnium(IV) MSDS
Material safety data sheet for tetrakis(dimethylamido)hafnium(IV) (aka TDMA-Hf) an ALD precursor used for hafnium oxide and hafnium nitride.
File Tungsten Hexacarbonyl W(CO)6
Material safety data sheet for tungsten hexacarbonyl.
File Tetrakis(dimethylamido)zirconium(IV) (TDMA-Zr) MSDS
Material safety data sheet for tetrakis(dimethylamido)zirconium(IV) (aka TDMA-Zr), an ALD precursor used for zirconium oxide.
File Tetrakis(ethylmethylamido)zirconium(IV) (TEMA-Zr) MSDS
Material safety data sheet for tetrakis(ethylmethylamido)zirconium(IV) (aka TEMA-Zr), an ALD precursor used for zirconium oxide.
File Tris(diethylamido)(tert-butylimido)tantalum(V)
Material safety data sheet for Tris(diethylamido)(tert-butylimido)tantalum(V) (aka TDETB-Ta), an ALD precursor used for tantalum oxide and tantalum nitride.
File Tris[dimethylamino]Silane (3DMAS) MSDS
Material safety data sheet for tris(dimethylamino)silane (aka 3DMAS), an ALD precursor for silicon dioxide.
File (3-Aminopropyl)triethoxysilane (APTES) MSDS
Material safety data sheet for (3-Aminopropyl)triethoxysilane (aka APTES) an ALD precursor used in silicon dioxide.
File Tris(tert-botoxy)silanol MSDS
Material safety data sheet for tris(tert-butoxy)silanol, an ALD precursor used for silicon dioxide.
File Trimethyl(methylcyclopentadienyl)platinum(IV) MSDS
Material data safety sheet for Trimethyl(methylcyclopentadienyl)platinum(IV), an ALD precursor used for Pt.
File Bis(cyclopentadienyl)nickel (nickelocene) MSDS
Material safety data sheet for Bis(cyclopentadienyl)nickel (aka nickelocene), an ALD precursor for Ni oxide and Ni films.
File Bis(ethylcyclopentadienyl)ruthenium(II) MSDS
Material safety data sheet for Bis(ethylcyclopentadienyl)ruthenium(II), an ALD precursor used in the deposition of Ru.
File Diethylzinc (DEZ) MSDS
Material safety data sheet for diethylzinc (DEZ), an ALD precursor used for zinc oxide.
File Tris[N,N-bis(trimethylsilyl)amide]yttrium MSDS
Material safety data sheet for Tris[N,N-bis(trimethylsilyl)amide]yttrium, an ALD precursor used for yttrium oxide.
File Cyclopentadienyl-indium MSDS
Material safety data sheet for Cyclopentadienylindium, which can be used as an ALD precursor for Indium oxide or Indium=Tin--Oxide (ITO).
File Tetrakis(dimethylamino)tin(IV) TDMA-Sn MSDS
Material safety data sheet for tetrakis(dimethylamino)tin (aka TDMA-Sn) an ALD precursor used in making tin oxide or indium tin oxide (ITO).
File Tris(cyclopentadienyl)yttrium (3CpY) MSDS
Material safety data sheet for tris(cyclopentadienyl)yttrium (aka 3CpY) a precursor for atomic layer deposition for Y2O3 and Y-stanbilized Zirconia.
File Tetramethyl-Tin
Tetramethyl Tin is an organo-metallic precursor with potential use for atomic layer deposition of tin oxide.
File Trimethylgallium
File Bis(1,2,4-triteriarybutylcyclopentadienyl)-strontium
File Bis(ethylcyclopentadienyl)nickel(II) MSDS
File Ferrocene
ALD Precursor used to make Fe2O3
File Titanium (IV) Isopropoxide (TTIP) MSDS
Titanium (IV) Isopropoxide MSDS for ALD
File Bis(n-propyltetramethycyclopentadienyl)barium MSDS
File Bis(pentamethylcyclopentadienyl)barium, 1,2-dimethoxyethane adduct MSDS
File Bis(cyclopentadienyl)cobalt (II) MSDS
File Fe amidinate MSDS (Accudep Iron)

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