2014031714 W. Liu- Etching Polyacrylonitrile- lithium perchlorate membrane with Au mask
Request to use PAN-LiClO4 film in PT-OX. Concern is using Li compounds in the shared equipment. Status: Approved for documented runs. Additional runs or larger substrates will require review by PROM committee.
- 20140317 W. Liu- Etching Polyacrylonitrile-lithium perchlorate membrane with Au mask
- PROM request form for etching Polyacrylonitrile-lithium perchlorate membrane with Au mask
- MSDS- Lithium Perchlorate
- MSDS for request
- MSDS- Polyacrylonitrile
- MSDS for PROM request