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2014031714 W. Liu- Etching Polyacrylonitrile- lithium perchlorate membrane with Au mask

Request to use PAN-LiClO4 film in PT-OX. Concern is using Li compounds in the shared equipment. Status: Approved for documented runs. Additional runs or larger substrates will require review by PROM committee.
File 20140317 W. Liu- Etching Polyacrylonitrile-lithium perchlorate membrane with Au mask
PROM request form for etching Polyacrylonitrile-lithium perchlorate membrane with Au mask
File MSDS- Lithium Perchlorate
MSDS for request
File MSDS- Polyacrylonitrile
MSDS for PROM request

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