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2015 PROM Requests

PROM Request forms and supporting materials from 2015

20150128 J. Katz- Use of toluene at Headway

PROM request to use toluene solvent at Headway. Request approved with stipulation that even though there will be no storage in SNF, chemicals must be logged and a yellow sticker on the bottles while in use in the SNF.

20150128 J. Katz- Use of toluene at Headway - Read More…

20150213 L. Lee- Annealing Thulium Doped Samples

PROM request to anneal Thulium doped samples in tylan 9 and aw150-r. Request approved- oxide growth step required post anneal in furnace.

20150213 L. Lee- Annealing Thulium Doped Samples - Read More…

20150202 K. Harrison- Contamination Study of Semi-Clean SiGe Etch in LAMpoly

PROM request to perform contamination study of Semi-Clean SiGe in LAMpoly. Approved for study. Resubmission is required after data is collected.

20150202 K. Harrison- Contamination Study of Semi-Clean SiGe Etch in LAMpoly - Read More…

20150218 J. Katz- Ladder Polymers and Solvent

PROM request form to pattern and etch polymer film in SNF. Polymer deposition and solvent usage to be performed OUTSIDE the SNF.

20150218 J. Katz- Ladder Polymers and Solvent - Read More…

20150218 P. Kratz- Al2O3 ALD on K(Co)-doped BaFe2As2

Request to introduce new materials into the SNF for use on ALD. Request approved for Fiji2 at temperatures below 180C.

20150218 P. Kratz- Al2O3 ALD on K(Co)-doped BaFe2As2 - Read More…

20150220 M. Winterkorn- PbS film in Fiji3

Request to use PbS material in Fiji3 (heavily restricted tool). Request approved to process using carrier wafer.

20150220 M. Winterkorn- PbS film in Fiji3 - Read More…

20150403 M. Hanna- OSCoR SL Stripper 200

PROM request and supporting documents for use of SL Stripper 200 to enable lithography of organic electronic materials. Request approved.

20150403 M. Hanna- OSCoR SL Stripper 200 - Read More…

20150413 M. Mleczko- Al2O3 ALD on TMD in MVD Savannah

PROM form and supporting documents to do Al2O3 capping of exfoliated TMD structures in an inert environment. Request approved.

20150413 M. Mleczko- Al2O3 ALD on TMD in MVD Savannah - Read More…

20150520 D. Gray- Request to deposit amorphous TiO2 on SrTiO3 and LiNbO3 substrates in intlvac-sputter

PROM request and supporting documents to introduce new substrates and initiate new film development in Intlvac-spt. Request approved with dedicated wafer holder.

20150520 D. Gray- Request to deposit amorphous TiO2 on SrTiO3 and LiNbO3 substrates in intlvac-sputter - Read More…

20150527 L. Lee- Processing of Thulium Doped Samples

PROM request to process wafers with Thulium doping in litho, etch, and wet cleans. Contamination evaluation plan laid out. Request approved.

20150527 L. Lee- Processing of Thulium Doped Samples - Read More…

20150601 C. Chapin- 3:1 Sulfuric and phosphoric acid heated to 200C

PROM request and documentation from processing to run a Phos + Sulf process at 200C to etch III-V materials. Request approved.

20150601 C. Chapin- 3:1 Sulfuric and phosphoric acid heated to 200C - Read More…

20150602 S. Isaacson- Hybrid nanocomposite synthesis with polyimides

PROM request and supporting documents to bring new polyimide materials into the SNF. Request approved.

20150602 S. Isaacson- Hybrid nanocomposite synthesis with polyimides - Read More…

20150609 P. Gross- Nafion dispersion D1021 in SNF

PROM request to bring Nafion dispersion D1021 into SNF for processing in SNF. Dispersion will be done outside of SNF and labmembers will work with Usha to develop etch recipe.

20150609 P. Gross- Nafion dispersion D1021 in SNF - Read More…

20150609 M. Simon- Request to spin Teflon on Headway

PROM request and supporting documents to spin Teflon using Headway. Request approved.

20150609 M. Simon- Request to spin Teflon on Headway - Read More…

20150609 A. Benfante- ALD on thermally reduced graphene oxide in Fiji2

PROM form and supporting materials for ALD on thermally recduced graphene oxide in Fiji2. Graphene oxide coating will be done outside SNF. Request approved.

20150609 A. Benfante- ALD on thermally reduced graphene oxide in Fiji2 - Read More…

20150619 M. Essingmann- Request to use Langatate material into the SNF

PROM form and supporting documents to bring Langatate material into SNF. HSQ bonding procedure was also developed for this request. Request approved.

20150619 M. Essingmann- Request to use Langatate material into the SNF - Read More…

20150623 J. Kruger- Use of MasterBond UV15LV

PROM request and supporting materials to try new bonding material in the wafer saw room Laurel spinner. Request approved.

20150623 J. Kruger- Use of MasterBond UV15LV - Read More…

20150630 M. Radulaski- Hot wet etch for SiC

PROM form to use hot HF:Nitric etch for SiC. Request rejected due to safety concerns.

20150630 M. Radulaski- Hot wet etch for SiC - Read More…

20150714 J. Torgersen- Request to use CO on Fiji2

PROM request and supporting documents to use CO gas for nucleation studies on Fiji2. Request approved.

20150714 J. Torgersen- Request to use CO on Fiji2 - Read More…

20150723 H. Deng- Deposit 75nm Al2O3 in Savannah

PROM request to exceed maximum thickness allowed for ALD deposition. Requestor decided to send wafers out for sputter deposition instead.

20150723 H. Deng- Deposit 75nm Al2O3 in Savannah - Read More…

20150813 S. Doshay- HSQ Bonding in evbonder

PROM form to develop HSQ Bonding process in evbonder. Request approved.

20150813 S. Doshay- HSQ Bonding in evbonder - Read More…

20150813 K. Zhang- Post wafer dicing pieces in lampoly

Request to take pieces post wafer dicing (gold contamination category) into lampoly (clean contamination category). Request approved.

20150813 K. Zhang- Post wafer dicing pieces in lampoly - Read More…

20150817 S. Stanwyck- HgCdTe/HgTe/HgCdTe quantum wells on GaAs substrate

PROM request and supporting documents for new materials in Savannah. Request approved- recipe conditions are low temperature, substrates are on carrier wafers, and coating will be performed after the runs.

20150817 S. Stanwyck- HgCdTe/HgTe/HgCdTe quantum wells on GaAs substrate - Read More…

20150817 M. Fardy- Ferritin from Equine Spleen

PROM form and supporting documents to bring Ferritin in SNF for CNT catalyst. Wet processing to be done outside of SNF in nSiL. Request approved.

20150817 M. Fardy- Ferritin from Equine Spleen - Read More…

20150831 P. Pavani- Exnodes PROM

PROM form requesting use of cleanroom space to conduct demo of user equipment. Request approved.

20150831 P. Pavani- Exnodes PROM - Read More…

20150902 P. Chakthranont- ITO Sputtering Target for Metallica

PROM request and supporting documents to develop ITO sputter recipe for Metallica. Request approved.

20150902 P. Chakthranont- ITO Sputtering Target for Metallica - Read More…

20150903 J. Xie-LixAlyOz ALD

PROM request and supporting documents to do Lithium-Aluminum Oxide recipe development in Savannah. Request approved. Savannah chamber will need to be sent for cleaning after processing.

20150903 J. Xie-LixAlyOz ALD - Read More…

20150914 J. Provine- CMP of PbS

PROM request and supporting documents to process PbS film in CMP. Request approved.

20150914 J. Provine- CMP of PbS - Read More…

20150923 B. Allen- Modified Process on STS

PROM form to use STS to generate Ni catalyst balls from Ni thin film. Request approved.

20150923 B. Allen- Modified Process on STS - Read More…

20150923 Y. Lee- FFEM LCD Resist and Developer for Lithography

PROM form and supporting documents to use SK6000 Resist and CD-2060 Developer for 2 weeks in the SNF. Request approved.

20150923 Y. Lee- FFEM LCD Resist and Developer for Lithography - Read More…

20150923 Y. Lee- Microchem PRL for Lithography

PROM Request and supporting materials to use Microchem protective resist layer. Request approved.

20150923 Y. Lee- Microchem PRL for Lithography - Read More…

20150930 S. Doshay- Etching of contaminated pieces in Lampoly

PROM request to etch contaminated pieces in semi-clean Lampoly tool. Request approved with ICPMS data collection.

20150930 S. Doshay- Etching of contaminated pieces in Lampoly - Read More…

20151119 S. Achira- Use of new SrO Precursor in Fiji2

PROM form and supporting documents for experimental BASF SrO precursor use in Fiji2. Request approved.

20151119 S. Achira- Use of new SrO Precursor in Fiji2 - Read More…

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