Skip to content. | Skip to navigation

Sections
Personal tools
You are here: Home / Materials/Chemicals / Process or Materials Review Requests (PROM) and Form / 2015 PROM Requests / 20150723 H. Deng- Deposit 75nm Al2O3 in Savannah
Navigation
 

20150723 H. Deng- Deposit 75nm Al2O3 in Savannah

PROM request to exceed maximum thickness allowed for ALD deposition. Requestor decided to send wafers out for sputter deposition instead.

Document Actions