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2016 PROM REQUESTS SUMMARY TABLE

Index of PROM Requests for 2016
Date Title Requester Description Status
1/19/2016 Request to use SG-5001L Color Resist
Labmember Request to use SG-5001L Color Resist in SNF. Approved.  Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for details.
1/19/2016  Request to allow using attachments on Woollam ellipsometer that enable characterization of liquid samples  Naik, G.  Request to create liquid sample attachments for Woollam.  Approved. 
2/02/2016 Spin coat polyimide in Fiji2
Kim, H.
Request to allow spin coated PI in Fiji2.
Approved.
3/14/2016
H2 Anneal in CVD Nano Tube Tool of Silicon for Smoothing Sidewall Scallops Formed During Bosch Process Deep Silicon Etch Menche, D.
Request to create Si smoothing process in CNT furnace (similar to Epi process but in contamintated category furnace).
Approved.
3/14/2016 XeF2 etching of Si pillars implanted in retina fixed in resin Lei, X.
Request to use XeF2 etcher to etch rat retina embedded with Si.
Approved.
3/21/2016
Request to use Zeocoat ES2110-10 Labmember
Request to use Zeocoat ES2110-10 in SNF.
Approved.  Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for details.
3/29/2016 Bringing Transene TE-100 into SNF Huang, T.
Request to bring new chemical into SNF for ITO etch.
Approved.  Waste must be collected and tagged for disposal.
4/1/2016 ALD Deposition on Carbon Felts
 Xie, J.
 Request to use Fiji2 for Carbon Felt substrate.
Approved.
4/8/2016  ITO Etching in Ox35
Huang, T.
Request to change contamination level and use Ox35 for ITO etching.
Approved with ongoing data collection.
4/25/2016  Request to use DL1000C Polyimide
Labmember Request to use DL1000C Polyimide in SNF
Approved.  Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for details.
4/27/2016
Request to run Fiji3 as Semiclean
Hu, X.
VPD-ICPMS Data collection done to demonstrate procedure will allow Fiji3 to operate as semiclean.
Data collected and reviewed by committee.  Approved.
5/4/2016
Request to use Envirotex Lite Resin in nSiL
Chang, T.
Request to spin coat Envirotex Lite Resin in nSiL Spin coater.
Approved.
5/6/2016
Request to use Dynaloy Dynastrip
Menche, D.
Request to use Dynaloy Dynasrip in the SNF.
Approved for use in the solvent bench.  Separate waste collection and tagging required.
6/13/2016
Request for new Cu Etchant
Labmember
Request to use new copper etchant.
Approved.  Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for details.
6/14/2016
Request to spin coat birnessite
Hausleden, D.
Request to spin coat MnO2 slurry in CMP room spin coater.
Approved.
6/29/2016
Request to move transfer station into nSiL glovebox
McClellan, C.
Transfer station will be available for shared use.
Approved.
7/19/2016
Request to use DPI-3000 Polyimide
Labmember
Request to use DPI-3000 Polyimide in the SNF.
Approved.  Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for details.
7/20/2016
Request to add new module (SThM) to Veeco AFM
Munoz-Rojo, M.
Installation and management of new module for existing Veeco AFM.  New thermal scanning capability will be available to any labmember.
Approved.
7/26/2016
Request for Cr2O3 target in AJA-Evap
Hausladen, D.
User to bring in own target for Cr2O3 deposition in AJA-Evap.
Approved.  SNF Staff will take proper precautions during chamber clean to avoid inhalation of particles.
8/4/2016
ALD oxides in teos2
Winterkorn, M.
High quality oxides from teos2 required for devices, so contamination mitigation plan proposed to allow ALD films from Fiji1 to process in clean teos2.
Approved.
8/17/2016
Evaluation of Fiji Plasma Damage
Labmember
Material request to evaluate Fiji plasma system for damage.
Approved.  Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for details.
8/19/2016
UHV Al sputtering for processing in SNF
Flader, I.
Documenting processing for clean Al deposition in post-Gryphon SNF tool era.
Approved.
9/2/2016
Use of Cr(OH)3 in SNF
Hausladen, D.
Use of Cr(OH)3 slurry in Laurell-G.
Approved.
9/13/2016
Spin coating of ladder polymer on silicon chips
Jung, K.
Polymer synthesized in Prof. Xia's group (Chemistry) to be spin coated in SNF.
Approved for spin coater in CMP room.
10/5/2016
NeverWet Hydrophobic Coating for use in nSiL
Yang, M.
NeverWet Hydrophobic Coating to be used in nSiL lab.  SOP generated.
Approved.
10/12/2016
Solder Paste and Spheres for Finetech Bonding
Dowling, K. and Yang, M.
Use of Pb-containing paste and spheres for soldering using Finetech Flip Chip Bonder.
Approved.  Use of portable HEPA filter required due to Pb-containing materials.
10/24/2016
Use of Surfactant 1ATC9 for eGaIn sonication
Wu, E.
Use of 1ATC9 for sonication of solution to make eGaIn ink to use in Dimatix nano-ink jet printer.
Approved.
10/24/2016
Use of surfactant 1-dodecanethiol for eGaIn Sonication Wu, E.
Use of 1-dodecanethiol for sonication of solution to make eGaIn ink to use in Dimatix nano-ink jet printer. Approved.
10/25/2016
Ni foam use in Graphene Furnace
Razavi, M.
Use of Ni foam as substrate in graphene furnace.
Approved.
10/31/2016
ALD of Lithium containing thin films
Xie, J.
Change Fiji3 contamination categories to allow processing of Lithium-containing thin films.
Approved.  VPD-ICPMS data analysis demonstrated some remaining Li contamination risk to future Fiji3 users.  Lab community notified.
10/31/2016
Microchem LOR5A Liftoff Resist
Li, D.
Use of Microchem LOR5A Liftoff Resist in SNF.
Approved.
11/2/2106
Request for GaSb target in Lesker sputter Kumar, A.
Request for GaSb target in Lesker sputter.
Approved.  Coordination with equipment staff required to ensure safety precautions are taken.
12/5/2016
QB50 CubeSat servicing
Miller, R.
Allow debugging of cubesat in cleanroom using N2 guns.
Approved.
12/14/16
Classifying Fiji1 as a clean tool
Kim, H.
Procedure proposed to allow Fiji1 to be used as a clean tool.  Data collection required.  Collected data showed this procedure is not sufficient to remove contamination risk to epi.
Data collection approved.  Results demonstrated that procedure is not sufficient to remove contamination risk.

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