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2017 PROM Requests

PROM Request forms and supporting materials from 2017

20170321 F. Liu- Deposit LPCVD nitride on 10 nm ALD Al2O3

PROM form for procedure to go from Fiji1 (semiclean) to LPCVD furnace (clean). Request approved.

20170321 F. Liu- Deposit LPCVD nitride on 10 nm ALD Al2O3 - Read More…

20170519 E. Wu-Electrical Test Equipment for in-cleanroom capacitance test

PROM form to bring electrical test equipment in. Location identified in conjunction with staff. Request approved.

20170519 E. Wu-Electrical Test Equipment for in-cleanroom capacitance test - Read More…

20170530 I. Narkeviciute- Ta3N5 ALD in Fiji3

PROM form requesting non-standard processing in Fiji3. Request approved.

20170530 I. Narkeviciute- Ta3N5 ALD in Fiji3 - Read More…

Request to use Lampoly to etch Si deposited on ALD oxide/metal

PROM request for etch in clean contamination category tool of non-standard semiclean films. Request approved.

Request to use Lampoly to etch Si deposited on ALD oxide/metal - Read More…

20170524 Y. Wong- Hydrogen Anneal of Si Wafer after PT-DSE

PROM form to use epi for H-anneal. Request approved for anneal in graphene furnace, data showed graphene furnace is not viable solution.

20170524 Y. Wong- Hydrogen Anneal of Si Wafer after PT-DSE - Read More…

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